Microlithography projection optical system and method for manufacturing a device

ABSTRACT

In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This optical system can have an object-image shift (OIS) of about 75 mm or less. Metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. Such a catoptric microlithgraphy projection optical system can be implemented in a microlithography tool. Such a microlithography tool can be used to produce microstructured components.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No. 12/702,040, filed Feb. 8, 2010, which is a divisional application of U.S. application Ser. No. 12/233,384, filed Sep. 18, 2008, which is a continuation of international application PCT/EP 2007/000067, filed Jan. 5, 2007, which is a continuation of international application PCT/EP 2006/008869, filed Sep. 12, 2006. International application PCT/EP 2007/000067 also claims the benefit of U.S. Ser. No. 60/793,387, filed Apr. 7, 2006. International application PCT/EP2007/000067 and U.S. application Ser. No. 12/233,384 and Ser. No. 12/702,040 are incorporated by reference herein in their entirety.

FIELD

This disclosure relates to a microlithography projection optical system, such as a projection objective, a microlithographic tool including such an optical system, a method for microlithographic production of microstructured components using such a microlithographic tool and a microstructured component produced by such a method.

BACKGROUND

Projection objectives are widely used in microlithography to transfer a pattern from a reticle to a substrate by forming an image of the reticle on a layer of a photosensitive material disposed on the substrate. In general, projection objectives fall into three different classes: dioptric objectives; catoptric objectives; and catadioptric objectives. Dioptric objectives use refractive elements (e.g., lens elements) to image light from an object plane to an image plane. Catoptric objectives use reflective elements (e.g., mirror elements) to image light from an object plane to an image plane. Catadioptric objectives use both refractive and reflective elements to image light from an object plane to an image plane.

SUMMARY

In some embodiments, the disclosure provides an optical system that can be used as projection objective in a microlithography projection exposure apparatus and that can provide enhanced performance with respect to its us in projection objective metrology and testing.

In one aspect, the disclosure features a catoptric microlithography projection optical system that includes a plurality of reflective elements configured to image radiation from an object field in an object plane of the system to an image field in an image plane of the system. The system has an object-image shift of about 75 mm or less, and the image field has a size of at least 1 mm×1 mm.

In another aspect, the disclosure features a microlithography tool including an illumination system and a catoptric microlithography projection optical system as described in the preceding paragraph.

In a further aspect, the disclosure features a method of producing microstructured components that includes using the microlithography tool described in the preceding paragraph.

In certain embodiments, the disclosure provides an optical system with which metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. For example, embodiments of optical systems (e.g., high NA optical systems) may have relatively small or zero object-image shift which result in little or no translation of a central object field point when the optical system rotates about the rotation axis. Thus, when the optical system is subject to rotation, metrology and testing can be repeatable performed in the same field position without having to relocate that field position. The object-image shift in particular may be 50 mm or less (e.g., 25 mm or less). In some embodiments, the optical system can have zero object-image shift. This means that a rotation of the optical system around the object-image rotation axis causes no translation of an on-axis field point at all. The image field size of at least 1 mm×1 mm allows a high throughput with respect to substrates which are illuminated via the projection optical system.

The plurality of elements of the optical system may include four or more reflective elements. For example, the optical system may include six or more reflective elements. The projection objective can be a catoptric projection objective. The image plane of the optical system may be parallel to the object plane. The optical system may have a field at the image plane having a minimum radius of curvature of 300 mm. The optical system may have an entrance pupil which is located more than 2.8 m (e.g., more than 10 m) from the object plane. In general, in an optical system with freeform surfaces, an exactly defined pupil plane does not exist. When referring to an optical system having freeform surfaces, the term pupil plane is used to characterize a region perpendicular to the light being guided in the optical system where an intensity distribution corresponds to an illumination angle distribution in the object plane. The object plane of the optical system may be positioned between the plurality of elements and an entrance pupil of the optical system. Alternatively, the optical system may have an entrance pupil located at infinity. The imaged radiation may be reflected from an object positioned at the object plane. The object positioned at the object plane may be a reticle that is imaged by the plurality of elements to the image plane. The optical system may have a demagnification of 4×. A plurality of elements may be arranged to image the radiation to an intermediate image plane between the object plane and the image plane. In this case, a field stop may be positioned at or near the intermediate image plane. For example, the plurality of elements may include five elements and the intermediate image plane may be located between a fourth element and a fifth element along the path of the radiation from the object plane to the image plane. The object and image planes may be separated by a distance L of about 1 m or more. The optical path length of the radiation from the object plane to the image plane may be about 2 L or more (e.g., about 3 L or more, about 4 L or more). The plurality of elements may include at least one pair of adjacent elements in the path of the radiation, where the pair of adjacent elements is separated by about 0.5 L or more. In certain embodiments, none of the plurality of elements causes an obscuration of the exit pupil at the image plane. The plurality of elements may include four or more elements having free boards of about 25 mm or less and/or free boards of about 5 mm or more. The plurality of elements may include a first mirror and a second mirror, the first and second mirrors having a minimum distance from the object plane of d₁ and d₂ respectively, where d₁/d₂ is about two or more. The plurality of elements may include a first element in the path of the radiation from the object plane to the image plane, where the first element has positive optical power. The optical system may include an aperture stop positioned between the object plane and the image plane. The plurality of elements may include three elements and the aperture stop may be positioned between the second and third elements in the path of the radiation from the object plane to the image plane. Alternatively, the aperture stop may be positioned at the second element or at the third element or at some other position in the projection lens, e.g. between the first and the second element. The radiation may pass through the aperture stop once or twice. A radiation source which is used with the optical system may be a laser radiation source having a wavelength of about 300 nm or less (e.g., about 200 nm or less, about 100 nm or less).

In some embodiments, at least one of the elements is a reflective element having a rotationally asymmetric surface positioned in a path of the radiation, wherein the rotationally asymmetric surface deviates from a best-fit rotationally symmetric surface by at least λ at one or more locations. In the following specification, such a rotationally asymmetric surface is referred to as a freeform surface. Unlike spherical or aspherical mirrors, freeform surfaces do not have an axis of rotational symmetry. Freeform surfaces according to the present disclosure differ from known aspheric rotational symmetric mirror surfaces for EUV projection objectives in that such known aspheric mirror surfaces are described via a mathematical Taylor expansion, i.e. having a sag being given by a rotational symmetric polynomial of grade n. The center point of this Taylor expansion for all these polynomial terms is defined by a common optical axis. Known mirror surfaces are described by such an expansion, because the Taylor expansion is easy to calculate, easy to optimize and there exists a lot of experience in manufacturing such mirror surfaces. However, it was realized by the inventors that the known Taylor expansion with common center leads to an unwanted distortion which cannot be lowered below a certain level. This distortion limitation is inherent to rotational symmetric optical surfaces is avoided, when according to the disclosure one of the optical surfaces is embodied as freeform or rotationally asymmetric surface. In some embodiments, a freeform surface may be a surface that is mirror symmetric to a meridional plane of the optical system.

In certain embodiments, the best-fit rotationally asymmetric surface deviates by about 0.1λ or less from a surface corresponding to the equation:

$z = {\frac{{cr}^{2}}{1 + \sqrt{1 - {\left( {1 + k} \right)c^{2}r^{2}}}} + {\sum\limits_{j = 2}^{\alpha}\; {C_{j}x^{m}y^{n}}}}$ where ${j = {\frac{\left( {m + n} \right)^{2} + m + {3n}}{2} + 1}},$

z is the sag of the surface parallel to an axis, c is the vertex curvature and k is the conical constant, C_(j) is the coefficient of the monomial x^(m) y^(m), and α is an integer. This mathematical expansion of the freeform surface can give a good and reproducible manufacturing of the reflective surfaces. In this expansion, a may be 66, for example. Further, m may consist of even integers, for example. Further, m+n may be equal to or bigger than 10, for example.

In some embodiments, the rotationally asymmetric surface deviates from the best-fit rotationally symmetric surface by about 10λ or more at the one or more locations. In certain embodiments, the rotationally asymmetric surface deviates from the best-fit rotationally symmetric surface by about 20 nm or more at the one or more locations.

A deviation of the type described in the preceding paragraph can provide for a proper reduction of the objective's distortion below the limit which is reachable using rotationally symmetric optical surfaces. The rotationally asymmetric surface may deviate from the best-fit rotationally symmetric surface by about 100λ or more at the one or more locations. The rotationally asymmetric surface may deviate from the best-fit rotationally symmetric surface by about 50 nm or more (e.g., about 100 nm or more, about 500 nm or more, about 1000 nm or more) at the one or more locations.

In some embodiments, the plurality of reflective elements define a meridional plane, and the elements are mirror symmetric with respect to the meridional plane. In such embodiments, for example, restrictions on producing a freeform optical surface may be reduced.

In some embodiments, having two reflective elements with freeform optical surfaces can lead to the possibility of a better aberration minimization while also allowing the possibility of meeting certain desired aberration minimization properties with less complicated to manufactured freeforms. The optical system also may have, for example, three, four, five or six freeform reflective elements.

An optical system having no more than two reflective elements with a positive chief ray angle magnification can exhibit relatively low incident ray angles on the mirrors, thus causing lower aberrations at the outset. This can hold in particular where the plurality of elements includes no more than one reflective element that has a positive chief ray angle magnification. This can be in particular advantageous for an optical system having divergent chief rays at the object plane and at least one intermediate image. Optical systems can be designed where it is sufficient to have only one reflective element having a positive chief ray angle magnification which serves to a redirection of the chief rays towards a central image field axis.

In some embodiments, the optical system can help provide high resolution. The image-side numerical aperture may be, for example, 0.25 or more (e.g., 0.28 or more, 0.3 or more, 0.35 or more, 0.4 or more).

In certain embodiments, the optical system can be efficiently used in a microlithography projection apparatus.

In some embodiments, the optical system can have a rectangular field at the image plane with, for example, a minimum dimension of about 2 mm. In certain embodiments, the rectangular field may have a first dimension of about 1 mm or more and a second dimension of about 1 mm or more where the first and second dimensions are orthogonal. The second dimension may be about 10 mm (e.g., about 20 mm or more).

In certain embodiments, the projection quality may be limited by only diffraction, i.e. by the wavelength of the projection light. An optical system with such low distortion in particular can be optimized for use, for example, with EUV light sources in the range between 10 and 30 nm.

In some embodiments, the disclosure provides a higher degree of flexibility with respect to the design of the optical system and neighbouring components.

In certain embodiments, the chief rays may be at an angle of about 3° or more (e.g., 5° or more, 7° or more) with respect to the object plane normal at the object plane.

In some embodiments, chief ray relations can be such that they lead to specific design and/or aberration minimization advantages.

In certain embodiments, diverging chief rays can be such that they give the possibility to control the distribution of illumination angles in the object plane by controlling an intensity distribution in the illumination optics in front of the projection objective with a low number of optical components. In an optical system with diverging chief rays, the object plane is positioned between the plurality of elements and an entrance pupil of the optical system. This may not be possible using an optical system with convergent (negative) chief ray angles as this would involve additional components to give access to a manipulation plane to control the distribution of illumination angles via an intensity distribution in this manipulation plane. Convergent chief rays can have the advantage that a good aberration control is possible and that smaller mirror sizes can be utilized to achieve a desired low aberration amount.

Maximum angles of incidence of the chief ray can be such that they help to avoid high aberrations at the outset. The maximum angle of incidence on a surface of each of the elements may be, for example, less than 18° (e.g., less than 15°).

In certain embodiments, a telecentric optical system can allow an object, such as a phase shift mask, to be imaged in the object plane having height variations.

In some embodiments, a telecentric optical system can tolerate height variations of a substrate arranged in the image plane.

In certain embodiments, the optical system can lead to a very high resolution. For example, in some embodiments, the ratio θ/NA may be about 60 or less (e.g., 50 or less).

In some embodiments, the optical system can have a radiation source and an illumination system that exploit advantageously the aberration minimization by use of metrology and testing, as aberrations and distortions in the range of the wavelength of such a radiation source are possible. Optionally, the wavelength is in a range from about 10 nm to about 15 nm.

In certain embodiments, the optical system can allow for illumination in the image field without illumination angle gaps.

The optical systems described herein can be used in a microlithographic tool and can offer the features disclosed herein. Such a tool can be used to make components.

Furthermore, embodiments can include one or more of the following advantages.

In some embodiments, a catoptric projection objective is telecentric at the image plane. This can provide for constant or nearly constant image magnification over a range of image-side working distances.

In certain embodiments, catoptric projection objectives have extremely high resolution. For example, projection objectives can have the capability of resolving structures smaller than about 50 nm. High resolution can be achieved in projection objectives that have a high image-side numerical aperture that are designed for operation at short wavelengths (e.g., about 10 nm to about 30 nm).

In some embodiments, projection objectives can provide images with low aberrations. In certain embodiments, projection objectives are corrected for wavefront error of about 30 mk or less. In certain embodiments, projection objectives are corrected for distortion below values of about 2 nm or less.

In some embodiments, catoptric objectives have a high numerical aperture and provide imaging with low image distortion, low wavefront error, and telecentricity at the image plane over a relatively large image field. These features can be achieved by use of one or more freeform mirrors.

In some embodiments, projection objective metrology can be easily implemented despite rotations of the projection objective about a rotation axis. For example, embodiments of projection objectives (e.g., high NA projection objectives) may have relatively small or zero object-image shift which result in little or no translation of a central object field point when the projection objective rotates about the axis. Thus, when the projection objective is subject to rotation, metrology can be repeatable performed in the same field position without having to relocate that field position.

In certain embodiments, a catoptric projection objection has no field dependent pupil obscuration or no central pupil obscuration.

In some embodiments, projection objectives can be adapted for operation at a variety of different wavelengths, including visible and ultraviolet (UV) wavelengths. In certain embodiments, projection objectives can be adapted for operation at Extreme UV (EUV) wavelengths. Furthermore, in some embodiments, projection objectives can be adapted for use at more than one wavelength, or over a range of wavelengths.

In some embodiments, catoptric projection objectives can be used in lithography tools (e.g., lithography scanners) and can provide relatively low overscan. Low overscan is accomplished, for example, by using projection objectives with rectangular image fields. In such embodiments, the image can be aligned so that an edge of the rectangular field is parallel to the leading edge of the die sites, allowing one to avoid scanning the leading edge of the die sites beyond the edge of the image field in order to scan the site corners, as is typically the case when rectangular or square die sites are scanned relative to arcuate fields.

In some embodiments, the disclosure provides lithography tools with relatively high throughput. For example, in certain embodiments, lithography tools can have relatively low overscan are more efficient than comparable systems that have larger overscan. Accordingly, these low overscan systems can provide higher wafer throughput than the comparable systems.

In some embodiments, catoptric projection objectives are provided that have low or no field dependence of shading effects. For example, catoptric projection objectives can have their entrance pupil located far from the object plane (e.g., at infinity) providing uniform illumination angles of the chief rays on the object field. This can reduce or avoid field dependent shading effects that occurs where chief ray angles vary across the object field. Alternatively, or additionally, projection objectives can have relatively small values of chief ray incident angles and/or small variations of incident angles for rays in the meridional section for each mirror in the projection objective, resulting in an increased average reflectivity of each mirror.

In certain embodiments, projection objective can include features that allow a reduction in the complexity of the illumination system. For example, the location of the entrance pupil of projection objectives may be in front of the object plane. In other words, chief rays starting at different field points are divergent with respect to each other. This can make the entrance pupil of the projection objective/exit pupil of the illumination system accessible without using a telescope in the illumination system to relay the illumination system's exit pupil to the location of the projection objective's entrance pupil.

Other features and advantages will be apparent from the description, the drawings, and the claims. All or selected features from the subclaims may be combined to form embodiments which are in particular advantageous.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic view of a microlithography tool.

FIG. 2A is a schematic view showing a portion of the microlithography tool shown in FIG. 1.

FIG. 2B is a cross-sectional view of a rotationally asymmetric surface and a corresponding rotationally symmetric reference surface.

FIG. 3 is a cross-sectional view of an embodiment of a projection objective shown in meridional section.

FIG. 4 is a cross-sectional view of a portion of a mirror from a projection objective shown in meridional section.

FIG. 5A is a schematic view of a ray path at a mirror having a positive chief ray angle magnification.

FIG. 5B is a schematic view of a ray path at a mirror having a negative chief ray angle magnification.

FIG. 6A is a view of a mirror's footprint.

FIG. 6B is a cross-section view of the mirror shown in FIG. 6A.

FIG. 7A is a plan view of an embodiment of a ring segment field.

FIG. 7B is a plan view of a ring segment field relative to a pair of wafer die sites.

FIG. 7C is a plan view of a rectangular field relative to a pair of wafer die sites.

FIGS. 8A-8E are schematic views of the projection objective of the embodiment of microlithography tool shown in FIG. 1.

FIG. 9 is a cross-sectional view of a portion of a projection objective shown in meridional section.

FIG. 10 is a cross-sectional view of a projection objective shown in meridional section.

FIG. 11 is a cross-sectional view of a projection objective shown in meridional section.

FIG. 12 is a cross-sectional view of a projection objective shown in meridional section.

FIG. 13 is a cross-sectional view of a projection objective shown in meridional section.

FIG. 14 is a cross-sectional view of an optical system that includes the projection objective shown in FIG. 13.

FIG. 15 is a cross-sectional view of a projection objective shown in meridional section.

FIG. 16A is an x-y vector plot showing calculated distortion as a function of position in the image field for the projection objective shown in FIG. 15.

FIG. 16B is an x-y vector plot showing calculated chief ray angle as a function of position in the image field for the projection objective shown in FIG. 15.

FIG. 17 is a cross-sectional view of a projection objective shown in meridional section.

FIG. 18 is a cross-sectional view of projection objective shown in meridional section.

DETAILED DESCRIPTION

In one aspect, the disclosure relates to catoptric projection objectives that have one or more mirrors having a freeform mirror surface (referred to as freeform mirrors). Catoptric projection objectives with freeform mirrors can be used in microlithography tools. Referring to FIG. 1, a microlithography tool 100 generally includes a light source 110, an illumination system 120, a projection objective 101, and a stage 130. A Cartesian co-ordinate system is shown for reference. Light source 110 produces radiation at a wavelength λ and directs a beam 112 of the radiation to illumination system 120. Illumination system 120 interacts with (e.g., expands and homogenizes) the radiation and directs a beam 122 of the radiation to a reticle 140 positioned at an object plane 103. Projection objective 101 images radiation 142 reflected from reticle 140 onto a surface of a substrate 150 positioned at an image plane 102. The radiation on the image-side of projection objective 101 is depicted as rays 152. As shown in FIG. 1, the rays are illustrative only and not intended to be accurately depict the path of the radiation with respect to reticle 140, for example. Substrate 150 is supported by stage 130, which moves substrate 150 relative to projection objective 101 so that projection objective 101 images reticle 140 to different portions of substrate 150.

Projection objective 101 includes a reference axis 105. In embodiments where projection objective is symmetric with respect to a meridional section, reference axis 105 is perpendicular to object plane 103 and lies inside the meridional section.

Light source 110 is selected to provide radiation at a desired operational wavelength, λ, of tool 100. In some embodiments, light source 110 is a laser light source, such as a KrF laser (e.g., having a wavelength of about 248 nm) or an ArF laser (e.g., having a wavelength of about 193 nm). Non-laser light sources that can be used include light-emitting diodes (LEDs), such as LEDs that emit radiation in the blue or UV portions of the electromagnetic spectrum, e.g., about 365 nm, about 280 nm or about 227 nm.

Typically, for projection objectives designed for operation in lithography tools, wavelength λ is in the ultraviolet portion, the deep ultraviolet portion or the extreme ultraviolet portion of the electromagnetic spectrum. For example, λ can be about 400 nm or less (e.g., about 300 nm or less, about 200 nm or less, about 100 nm or less, about 50 nm or less, about 30 nm or less). λ can be more than about 2 nm (e.g., about 5 nm or more, about 10 nm or more). In embodiments, λ can be about 193 nm, about 157 nm, about 13 nm, or about 11 nm. Using a relatively short wavelength may be desirable because, in general, the resolution of a projection objective is approximately proportional to the wavelength. Therefore shorter wavelengths can allow a projection objective to resolve smaller features in an image than equivalent projection objectives that use longer wavelengths. In certain embodiments, however, λ can be in non-UV portions of the electromagnetic spectrum (e.g., the visible portion).

Illumination system 120 includes optical components arranged to form a collimated radiation beam with a homogeneous intensity profile. Illumination system 120 typically also includes beam steering optics to direct beam 122 to reticle 140. In some embodiments, illumination system 120 also include components to provide a desired polarization profile for the radiation beam.

Object plane 103 is separated from image plane 102 by a distance L, which is also referred to as the lengthwise dimension, or tracklength, of projection objective 101. In general, this distance depends on the specific design of projection objective 101 and the wavelength of operation of tool 100. In some embodiments, such as in tools designed for EUV lithography, L is in a range from about 1 m to about 3 m (e.g., in a range from about 1.5 m to about 2.5 m). In certain embodiments, L is less than 2 m, such as about 1.9 m or less (e.g., about 1.8 m or less, about 1.7 m or less, about 1.6 m or less, about 1.5 m or less). L can be more than about 0.2 m or more (e.g., about 0.3 m or more, about 0.4 m or more, about 0.5 m or more, about 0.6 m or more, about 0.7 m or more, about 0.8 m or more, about 0.9 m or more, about 1 m or more).

The ratio of the optical path length of imaged radiation to the tracklength varies depending on the specific design of projection objective 101. In some embodiments, the ratio of this optical path length to tracklength can be relatively high. For example, the ratio of this optical path length to tracklength can be about two or more (e.g., about 2.5 or more, about three or more, about 3.5 or more, about four or more, about 4.5 or more, about five or more).

Projection objective 101 has a magnification ratio, which refers to the ratio of the dimensions of the field at object plane 103 to the corresponding dimensions of the field at image plane 102. Typically, projection objectives used in lithography tools are reduction projection objectives, meaning they reduce the dimensions of, or demagnify, the image. In some embodiments, therefore, projection objective 101 can produce a field at image plane 102 whose dimensions are reduced by about 2× or more (e.g., about 3× or more, about 4× or more, about 5× or more, about 6× or more, about 7× or more, about 8× or more, about 9× or more, about 10× or more) compared to the dimensions at object plane 103. In other words, projection objective 101 can have a demagnification of about 2× or more, (e.g., about 3× or more, about 4× or more, about 5× or more, about 6× or more, about 7× or more, about 8× or more, about 9× or more, about 10× or more). More generally, however, projection objectives can be designed to provide a magnified image or an image the same size as the object.

Referring also to FIG. 2A, rays 152 define a cone of light paths that form the reticle image at image plane 102. The angle of the cone of rays is related to the image-side numerical aperture (NA) of projection objective 101. Image-side NA can be expressed as

NA=n _(o) sin θ_(max),

where n_(o) refers to the refractive index of the immersing medium adjacent the surface of substrate 150 (e.g., air, nitrogen, water, or evacuated environment), and θ_(max) is the half-angle of the maximum cone of image forming rays from projection objective 101.

In general, projection objective 101 can have an image side NA of about 0.1 or more (e.g., about 0.15 or more, about 0.2 or more, about 0.25 or more, about 0.28 or more, about 0.3 or more, about 0.35 or more). In some embodiments, projection objective 101 has a relatively high image-side NA. For example, in some embodiments, projection objective 101 has an image-side NA of more than 0.4 (e.g., about 0.45 or more, about 0.5 or more, about 0.55 or more, about 0.6 or more). In general, the resolution of projection objective 101 varies depending on wavelength λ and the image-side NA. Without wishing to be bound by theory, the resolution of a projection objective can be determined based on the wavelength and image-side NA based on the formula,

${R = {k\; \frac{\lambda}{NA}}},$

where R is the minimum dimension that can be printed and k is a dimensionless constant called the process factor. k varies depending on various factors associated with the radiation (e.g., the polarization properties), the illumination properties (e.g., partial coherence, annular illumination, dipole settings, quadrupole settings, etc.) and the resist material. Typically, k is in a range from about 0.4 to about 0.8, but can also be below 0.4 and higher than 0.8 for certain applications.

Projection objective 101 is also nominally telecentric at the image plane. For example, the chief rays can deviate by about 0.5° or less (e.g., about 0.4° or less, about 0.3° or less, about 0.2° or less, about 0.1° or less, about 0.05° or less, 0.01° or less, 0.001° or less) from being parallel to each other at the image plane over the exposed field. Thus, projection objective 101 can provide substantially constant magnification over a range of image-size working distances. In some embodiments, the chief rays are nominally orthogonal to image plane 102. Thus, a non flat topography of the wafer surface or defocusing of the image plane does not lead necessarily to distortion or shading effects in the image plane.

In certain embodiments, projection objective 101 has a relatively high resolution (i.e., the value of R can be relatively small). For example, R can be about 150 nm or less (e.g., about 130 nm or less, about 100 nm or less, about 75 nm or less, about 50 nm or less, about 40 nm or less, about 35 nm or less, about 32 nm or less, about 30 nm or less, about 28 nm or less, about 25 nm or less, about 22 nm or less, about 20 nm or less, about 18 nm or less, about 17 nm or less, about 16 nm or less, about 15 nm or less, about 14 nm or less, about 13 nm or less, about 12 nm or less, about 11 nm or less, such as about 10 nm).

The quality of images formed by projection objective 101 can be quantified in a variety of different ways. For example, images can be characterized based on the measured or calculated departures of the image from idealized conditions associated with Gaussian optics. These departures are generally known as aberrations. One metric used to quantify the deviation of a wavefront from the ideal or desired shape is the root-mean-square wavefront error (W_(rms)). W_(rms) is defined in the “Handbook of Optics,” Vol. I, 2^(nd) Ed., edited by Michael Bass (McGraw-Hill, Inc., 1995), at page 35.3, which is incorporated herein by reference. In general, the lower the W_(rms) value for an objective, less the wavefront deviates from its desired or ideal shape, and the better the quality of the image. In certain embodiments, projection objective 101 can have a relatively small W_(rms) for images at image plane 102. For example, projection objective 101 can have a W_(rms), of about 0.1λ or less (e.g., about 0.07λ or less, about 0.06λ or less, about 0.05λ or less, about 0.045λ or less, about 0.04λ or less, about 0.035λ or less, about 0.03λ or less, about 0.025λ or less, about 0.02λ or less, about 0.015λ or less, about 0.01λ or less, such as about 0.005λ).

Another metric that can be used to evaluate the quality of the image is referred to as field curvature. Field curvature refers to the peak-to-valley distance for the field point dependent position of the focal plane. In some embodiments, projection objective 101 can have a relatively small field curvature for images at image plane 102. For example, projection objective 101 can have an image-side field curvature of about 50 nm or less (e.g., about 30 nm or less, about 20 nm or less, about 15 nm or less, about 12 nm or less, 10 nm or less).

A further metric that can be used to evaluate the optical performance is referred to as distortion. Distortion refers to the maximum absolute value of the field point dependent deviation from the ideal image point position in the image plane. In some embodiments, projection objective 101 can have a relatively small maximum distortion. For example, projection objective 101 can have a maximum distortion of about 50 nm or less, (e.g. about 40 nm or less, about 30 nm or less, about 20 nm or less, about 15 nm or less, about 12 nm or less, 10 nm or less, 9 nm or less, 8 nm or less, 7 nm or less, 6 nm or less, 5 nm or less, 4 nm or less, 3 nm or less, 2 nm or less, such as 1 nm).

Further, in certain embodiments, distortion can vary by a relatively small amount across the image field. For example, distortion can vary by about 5 nm or less (e.g., about 4 nm or less, about 3 nm or less, about 2 nm or less, about 1 nm or less) across the image field.

Being a catoptric system, projection objective 101 includes a number of mirrors arranged to direct radiation reflected from reticle 140 to substrate 150 in a way that forms an image of reticle 140 on the surface of substrate 150. Specific designs of projection objectives are described below. More generally, however, the number, size, and structure of the mirrors generally depends on the desired optical properties of projection objective 101 and the physical constraints of tool 100.

In general, the number of mirrors in projection objective 101 may vary. Typically, the number of mirrors is related to various performance trade-offs associated with the optical performance characteristics of the objective, such as the desired throughput (e.g., the intensity of radiation from the object that forms the image at image plane 102), the desired image-side NA and related image resolution, and the desired maximum pupil obscuration.

In general, projection objective 101 has at least four mirrors (e.g., five or more mirrors, six or more mirrors, seven or more mirrors, eight or more mirrors, nine or more mirrors, ten or more mirrors, eleven or more mirrors, twelve or more mirrors). In embodiments where it is desirable that all the mirrors of the objective are positioned between the object plane and the image plane, objective 101 will typically have an even number of mirrors (e.g., four mirrors, six mirrors, eight mirrors, ten mirrors). In certain embodiments, an odd number of mirrors can be used where all the mirrors of the projection objective are positioned between the object plane and image plane. For example, where one or more mirrors are tilted at relatively large angles, a projection objective can include an odd number of mirrors where all the mirrors are positioned between the object plane and image plane.

In general, at least one of the mirrors in projection objective 101 has a freeform surface. Unlike spherical or aspherical mirrors, freeform mirror surfaces do not have an axis of rotational symmetry. Generally, a freeform surface deviates from a best fit rotationally symmetric surface (e.g., a spherical or aspherical surface). Rotationally-symmetric reference surfaces can be determined for a freeform mirror surface as follows. First, one obtains information that characterizes the freeform mirror surface under consideration. In embodiments where optical data of the mirror is known, this information includes determining the basic radius of the mirror (e.g. 1/c, where c is the vertex curvature), a conic constant of the mirror, k, and polynomial coefficients characterizing the mirror. Alternatively, or additionally, the information characterizing the mirror can be obtained from a surface figure measurement of the mirror surface (e.g. obtained using an interferometer). A surface figure measurement can provide a function z′(x′, y′) describing the mirror's surface, where z′ is the sag of the mirror surface along the z′-axis for different (x′, y′) coordinates, as illustrated in FIG. 2B. The initial step also includes determining the footprint for the mirror, which refers to an area of the mirror surface that is actually used to reflect image-forming radiation in the objective. The footprint can be determined by tracing rays through the objective using a ray tracing program and extracting the mirror area contacted by the rays.

After obtaining the information characterizing the rotationally asymmetric surface, a local coordinate system for the surface is established for which decentration and tilt of the surface is zero. Setting the tilt and decentration of the surface gives a well defined starting point for an optimization algorithm to determine the reference surface and also define an axis, z′, along which the sag differences between the mirror surface and the reference surface can be determined. Where optical data for the mirror surface is known, the z′-axis is determined based on the conic constant, k, and basic radius, 1/c. For the rotationally symmetric portion of the optical data, the z′-axis is the symmetry axis for the rotationally symmetric part of the rotationally asymmetric surface. In embodiments where the mirror surface is characterized from a surface figure measurement, the z′-axis corresponds to the metrology axis (e.g. the interferometers optical axis). FIG. 2B illustrates this for a two-dimensional section of a rotationally asymmetric mirror 201, where the local coordinate system is denoted by the x′, y′ and z′ axes. The boundaries for the footprint of the rotationally asymmetric mirror 201 are shown as x_(min) and x_(max) for the cross-section shown in FIG. 2B.

An initial reference surface is then established with respect to the coordinate system. The initial reference surface has zero tilt and zero decentration. The initial reference surface is either a spherical surface or a rotationally symmetric aspherical surface. The initial reference surface is established by one designating a rotationally symmetric surface that approximates the rotationally asymmetric mirror surface. The initial reference surface represents a starting point for an optimization algorithm. Once the initial reference surface is established, a local distance, b_(i) (i=1 . . . N) between a number of points of the initial reference surface and points on the surface of the rotationally asymmetric surface footprint measured along the z′-axis of the local coordinate system are determined. Next, the rotationally symmetric reference surface (surface 211 in FIG. 2B) is established by determining a minimal value for the local distances (d_(i)) using a number fitting parameters and a fitting algorithm. In the event that the rotationally symmetric reference surface is a spherical surface, the parameters include the location of the center of the sphere within the local coordinate system, the radius, of the reference surface. In FIG. 2B, decentering of the sphere center from the coordinate system origin is shown by coordinates x_(c) and z_(c) (decentration along the y′-axis by an amount y_(c) is not shown in FIG. 2B). The radius of the spherical surface is designated as R. The parameters R, x_(c), y_(c) and z_(c) are optimized to provide a minimal value for the local distances, d_(i), based on the equation:

z′=(R ²−(x′−x _(c))−(y′−y _(c))²)^(1/2) −z _(c),

which is the equation for a spherical surface of radius R, centered at coordinate (x_(c), y_(c), z_(c)).

Where the rotationally symmetric reference surface is an aspherical surface, the parameters can include decentration and tilt of the reference surface, base radius, conical constant and aspherical coefficients. These parameters can be determined based on the equation

${z^{\prime} = {\frac{c^{\prime}h^{2}}{1 + \sqrt{1 - {\left( {1 + k^{\prime}} \right)c^{\prime 2}h^{2}}}} + {\sum\limits_{j}\; {A_{j}^{\prime}h^{2j}}}}},$

which is an equation describing conic and aspheric surfaces. Here, h²=x′²+y′², and A′_(j) are coefficients characterizing the deviation of the rotationally-symmetric reference surface from a conic surface. Generally, the number of aspherical coefficients, A′_(j), used to fit the reference surface to the mirror surface can vary depending on the computational power of the system being used to calculate the surface, the time available, and the desired level of accuracy. In some embodiments, the reference surface can be calculated using aspherical coefficients up to third order. In certain embodiments, coefficients higher than third order (e.g., fourth order, sixth order) are used. For additional discussion on parameterization of conic and aspheric surfaces see, for example, the product manual for Code V, available from Optical Research Associates (Pasadena, Calif.).

In general, fitting can be performed using a variety of optimization algorithms. For example, in some embodiments, a least squares fitting algorithm, such as a damped least squares fitting algorithm, can be used. Damped least squares fitting algorithms may be performed using commercially-available optical design software, such as Code V or ZEMAX (available from Optima Research, Ltd., Stansted, United Kingdom) for example.

After the rotationally-symmetric reference surface is determined, the local distance between additional points on the mirror surface can be determined and visualized. Additional characteristics of the rotationally-symmetric reference surface can be determined. For example, a maximum deviation of the rotationally-symmetric reference surface from the rotationally-asymmetric mirror surface can be determined.

A freeform surface can, for example, have a maximum deviation from a best fit sphere of about λ or more (e.g., about 10λ or more, about 20λ or more, about 50λ or more, about 100λ or more, about 150λ or more, about 200λ or more, about 500λ or more, about 1,000λ or more, about 10,000λ or more, about 50,000λ or more). A freeform surface can have, for example, a maximum deviation from a best fit rotationally symmetric asphere of about λ or more (e.g., about 5λ or more, about 10λ or more, about 20λ or more, about 50λ or more, about 100λ or more, about 200λ or more, about 500λ or more, about 1,000λ or more, about 10,000λ or more). In some embodiments, a freeform surface can have a maximum deviation from a best fit rotationally symmetric asphere of about 1,000λ or less (e.g., about 900λ or less, about 800λ or less, about 700λ or less, about 600λ or less, about 500λ or less).

In certain embodiments, freeform surfaces have a maximum deviation from a best fit sphere by 10 nm or more (e.g., about 100 nm or more, about 500 nm or more, about 1 μm or more, about 5 μm or more, about 10 μm or more, about 50 μm or more, about 100 μm or more, about 200 μm or more, about 500 μm or more, about 1,000 μm, about 2,000 μm or more, about 3,000 μm or more). Freeform surfaces can have a maximum deviation from a best fit sphere by about 10 mm or less (e.g., about 5 mm or less, about 3 mm or less, about 2 mm or less, about 1 mm or less, about 500 μm or less).

Freeform surfaces can have a maximum deviation from a best fit rotationally symmetric asphere by 10 nm or more (e.g., about 100 nm or more, about 500 nm or more, about 1 μm or more, about 5 μm or more, about 10 μm or more, about 50 μm or more, about 100 μm or more, about 200 μm or more, about 500 μm or more, about 1,000 μm). Freeform surfaces can have a maximum deviation from a best fit rotationally symmetric asphere by about 10 mm or less (e.g., about 5 mm or less, about 3 mm or less, about 2 mm or less, about 1 mm or less, about 500 μm or less).

The curvature of the mirror surfaces is characterized by a first and second mean principal curvature, which are determined at the point on each mirror surface that reflects the chief ray of the central field point. First and second principal curvatures are calculated as described in Handbook of Mathematics by I. N. Bronstein, et al., 4^(th) Ed. (Springer, 2004), p. 567. In general, the first principal curvature for a mirror can be different from the second principal curvature for that mirror. In some embodiments, the absolute value of the difference between the first and second principal curvatures can be about 10⁻⁸ or more (e.g., 10⁻⁷ or more, 5×10⁻⁷ or more, about 10⁻⁶ or more, about 5×10⁻⁶ or more, about 10⁻⁵ or more, about 5×10⁻⁵ or more, about 10⁻⁴ or more, about 5×10⁻⁴ or more, about 10⁻³ or more).

In general, the first and/or second principal curvatures can be positive or negative. The first and/or second principal curvatures for a mirror surface can be relatively small. For example, in some embodiments, the absolute value of the first principal curvature for one or more mirrors in projection objective 101 is about 10⁻² or less (e.g., about 5×10⁻³ or less, about 3×10⁻³ or less, about 2×10⁻³ or less, about 10⁻³ or less). The absolute value of the sum of the first principal curvatures for the mirrors in projective objective 101 can be about 10⁻³ or less (e.g., about 5×10⁻⁴ or less, about 3×10⁻⁴, about 2×10⁻⁴ or less, about 10⁻⁴ or less, 5×10⁻⁵ or less, 10⁻⁵ or less).

In certain embodiments, the absolute value of the second principal curvature for one or more mirrors in projection objective 101 is about 10⁻² or less (e.g., about 5×10⁻³ or less, about 3×10⁻³ or less, about 2×10⁻³ or less, about 10⁻³ or less). The absolute value of the sum of the second principal curvatures for the mirrors in projective objective 101 can be about 10⁻³ or less (e.g., about 5×10⁻⁴ or less, about 3×10⁻⁴, about 2×10⁻⁴ or less, about 10⁻⁴ or less, 5×10⁻⁵ or less, 10⁻⁵ or less).

The sum of the first and second principal curvatures of the mirrors in projection objective 101 can be relatively small. For example, the absolute value of the sum of the first and second principal curvatures of the mirrors can be about 10⁻³ or less (e.g., about 5×10⁻⁴ or less, about 3×10⁻⁴, about 2×10⁻⁴ or less, about 10⁻⁴ or less, 5×10⁻⁵ or less, 10⁻⁵ or less).

In certain embodiments, freeform mirror surfaces can be described mathematically by the equation:

$Z = {\frac{{cr}^{2}}{1 + \sqrt{1 - {\left( {1 + k} \right)c^{2}r^{2}}}} + {\sum\limits_{j = 2}^{66}\; {C_{j}X^{m}Y^{n}}}}$ where $j = {\frac{\left( {m + n} \right)^{2} + m + {3n}}{2} + 1}$

and Z is the sag of the surface parallel to a Z-axis (which may or may not be parallel to the reference axis 105 in projection objective 101, i.e. in general is decentered and tilted to the reference axis 105 in projection objective 101), c is a constant corresponding to the vertex curvature, k is a conic constant, and is the coefficient of the monomial X^(m)Y^(n). Typically, the values of c, k, and C_(j) are determined based on the desired optical properties of the mirror with respect to projection objective 101. Further, the order of the monomial, m+n, can vary as desired. Generally, a higher order monomial can provide a projection objective design with a higher level of aberration correction, however, higher order monomials are typically more computationally expensive to determine. In some embodiments, m+n is 10 or more (e.g., 15 or more, 20 or more). As discussed below, the parameters for the freeform mirror equation can be determined using commercially-available optical design software. In some embodiments, m+n is less than 10 (e.g., 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, 3 or less).

In general, freeform surfaces can be described mathematically using equations other than those presented above. For example, in some embodiments, freeform surfaces can be described mathematically using Zernike polynomials (such as presented in the manual for CODE V®, commercially available from Optical Research Associates, Pasadena, Calif.) or using two-dimensional spline surfaces. Examples of two-dimensional spline surfaces are Bezier splines or non-uniform rational Bezier splines (NURBS). Two-dimensional spline surfaces can be described, for example, by a grid of points in an x-y plane and corresponding z-values or slopes and these points. Depending on the specific type of spline surface, the complete surface is obtained by a specific interpolation between the grid points using, e.g., polynomials or functions that have certain properties with respect to continuity or differentiability (e.g., analytical functions).

In general, the number and position of freeform mirrors in projection objective 101 can vary. Embodiments include projection objectives with two or more freeform mirrors (e.g., three or more freeform mirrors, four or more freeform mirrors, five or more freeform mirrors, six or more freeform mirrors).

Projection objective 101 generally includes one or more mirrors with positive optical power. In other words, the reflective portion of the mirror has a concave surface and is referred to as a concave mirror. Projection objective 101 can include two or more (e.g., three or more, four or more, five or more, six or more) concave mirrors. Projection objective 101 can also include one or more mirrors that have negative optical power. This means that one or more of the mirrors has a reflective portion with a convex surface (referred to as a convex mirror). In some embodiments, projection objective 101 includes two or more (e.g., three or more, four or more, five or more, six or more) convex mirrors.

An embodiment of a projection objective that includes six mirrors is shown in FIG. 3. Specifically, projection objective 300 includes six freeform mirrors 310, 320, 330, 340, 350, and 360. Data for projection objective 300 is presented in Table 1A and Table 1B below. Table 1A presents optical data, while Table 1B presents freeform constants for each of the mirror surfaces. For the purposes of Table 1A and Table 1B, the mirror designations correlate as follows: mirror 1 (M1) corresponds to mirror 310; mirror 2 (M2) corresponds to mirror 320; mirror 3 (M3) corresponds to mirror 330; mirror 4 (M4) corresponds to mirror 340; mirror 5 (M5) corresponds to mirror 350; and mirror 6 (M6) corresponds to mirror 360. “Thickness” in Table 1A and subsequent tables refers to the distance between adjacent elements in the radiation path. The monomial coefficients, C_(j), for the freeform mirrors, along with the amount the mirror is decentered and rotated (or tilted) from an initial projection objective design, are provided in Table 1B. R, the radius, is the inverse of the vertex curvature, c. Decenter is given in mm and rotation is given in degrees. Units for the monomial coefficients are mm^(−j+1). Nradius is a unitless scaling factor (see, for example, the manual for CODE V®).

In FIG. 3, projection objective 300 is shown in meridional section. The meridional plane is a symmetry plane for projection objective 300. Symmetry about the meridional plane is as the mirrors are decentered only with respect to the y-axis and tilted about the x-axis. Further, the coefficients for the freeform mirrors having an odd degree in the x-coordinate (e.g., x, x³, x⁵, etc.) are zero.

Projection objective 300 is configured for operation with 13.5 nm radiation and has an image-side NA of 0.35 and a tracklength of 1,500 mm. The optical path length of imaged radiation is 3.833 mm. Accordingly, the ratio of optical path length to tracklength is approximately 2.56. Projection objective has a demagnification of 4×, a maximum distortion of less than 100 nm, W_(rms) of 0.035λ, and a field curvature of 28 nm. Additional characteristics of projection objective 300 are presented in the discussion of projection objective 101 that follows.

For example, the first mirror in the radiation path from object plane 103, mirror 310, has positive optical power. Mirrors 320, 340, and 360 are also P mirrors. Mirrors 330 and 350 have (N) negative optical power. The sequence of mirrors in the radiation path in projection objective 300 is thus PPNPNP.

TABLE 1A Surface Radius (mm) Thickness (mm) Mode Object INFINITY 714.025 Mirror 1 −1678.761 −414.025 REFL Mirror 2 2754.233 564.025 REFL Mirror 3 350.451 −316.293 REFL Mirror 4 590.379 906.948 REFL Mirror 5 433.060 −435.447 REFL Mirror 6 521.283 480.767 REFL Image INFINITY 0.000

TABLE 1B Coefficient M1 M2 M3 M4 M5 M6 K −5.917992E−01 1.401977E+00 −1.852312E+00 3.134672E+00 1.276852E+00 2.162747E−01 Y 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X² 2.486175E−04 6.462590E−04 8.097144E−05 3.683589E−05 −5.694587E−04 1.127522E−05 Y² 1.796052E−04 −1.218131E−05 −3.272168E−05 −7.479058E−05 −3.798909E−04 5.142215E−05 X²Y −3.704365E−08 −3.061838E−06 1.166808E−07 1.073313E−07 3.054784E−06 −1.901527E−08 Y³ −8.473076E−09 −4.336504E−06 −6.831514E−08 −2.680850E−08 1.944165E−06 2.077407E−09 X⁴ 1.525482E−11 2.440415E−10 −2.839993E−11 −8.352784E−11 1.477727E−09 −1.231925E−10 X²Y² 4.909383E−11 1.819997E−09 −2.639958E−11 −7.953809E−11 1.884598E−08 −4.030921E−11 Y⁴ 7.241758E−11 −1.924132E−08 −1.611187E−10 −1.805904E−10 2.829058E−09 −6.788132E−11 X⁴Y −3.944773E−14 −3.384346E−12 4.634420E−14 1.089774E−13 4.746215E−11 7.092901E−15 X²Y³ −2.485019E−13 −1.985647E−10 −1.749321E−13 2.706968E−13 1.878106E−10 7.623271E−14 Y⁵ −6.222758E−14 1.546404E−10 −7.306272E−14 1.121470E−13 2.713089E−11 1.059625E−13 X⁶ −2.853060E−17 1.499373E−14 −3.327224E−16 −3.396117E−16 1.122966E−13 −7.141998E−16 X⁴Y² 5.428060E−17 −4.560639E−13 −2.729510E−17 1.958645E−17 4.975385E−13 −1.157245E−15 X²Y⁴ 9.034205E−16 4.633694E−13 −4.803414E−16 4.337124E−16 9.650331E−13 −6.079561E−16 Y⁶ 9.726812E−16 −1.567936E−12 −9.119915E−19 3.224937E−16 −4.013641E−13 −1.910957E−16 X⁶Y 7.541120E−20 −5.491590E−16 −3.248735E−18 −4.999870E−18 1.809992E−15 1.533677E−19 X⁴Y³ −7.407407E−19 1.626025E−15 −4.175176E−19 −1.121906E−18 4.277794E−15 7.709209E−19 X²Y⁵ −3.053897E−18 −1.459850E−15 −5.190383E−19 9.702383E−19 5.157566E−15 9.414679E−19 Y⁷ −1.167661E−17 1.377526E−14 −3.283791E−21 9.398678E−20 −3.053184E−15 3.954522E−19 X⁸ −1.128385E−22 −2.091289E−19 −1.560172E−21 −2.941200E−21 2.054965E−18 −3.788563E−21 X⁶Y² −2.424101E−21 −5.485841E−18 −1.205060E−20 −3.188366E−20 8.911569E−18 −9.560288E−21 X⁴Y⁴ 4.347588E−22 −3.722786E−17 −1.249304E−21 −8.368608E−21 1.007777E−17 −8.789392E−21 X²Y⁶ 2.577199E−21 −2.687589E−17 −2.354061E−22 8.597809E−22 1.143993E−17 −3.545101E−21 Y⁸ 5.215288E−20 −7.369037E−17 −4.229309E−23 −6.689468E−22 −7.499429E−18 −1.703637E−21 X⁸Y 7.792174E−25 0.000000E+00 −7.813621E−24 −2.516130E−23 0.000000E+00 8.396981E−25 X⁶Y³ 8.992421E−24 0.000000E+00 −1.921637E−23 −8.262460E−23 0.000000E+00 4.664369E−24 X⁴Y⁵ −4.714974E−25 0.000000E+00 −1.610571E−24 −1.778199E−23 0.000000E+00 9.398752E−24 X²Y⁷ 6.059892E−24 0.000000E+00 3.848059E−26 1.222213E−24 0.000000E+00 1.042278E−23 Y⁹ −8.700880E−23 0.000000E+00 6.368781E−27 −2.288415E−25 0.000000E+00 7.789109E−24 X¹⁰ 0.000000E+00 0.000000E+00 −5.411923E−27 −1.603639E−26 0.000000E+00 −3.929816E−26 X⁸Y² 0.000000E+00 0.000000E+00 −8.609679E−27 −4.538477E−26 0.000000E+00 −1.453997E−25 X⁶Y⁴ 0.000000E+00 0.000000E+00 −1.127835E−26 −7.710579E−26 0.000000E+00 −1.839705E−25 X⁴Y⁶ 0.000000E+00 0.000000E+00 −8.495275E−28 −1.413945E−26 0.000000E+00 −8.230974E−26 X²Y⁸ 0.000000E+00 0.000000E+00 4.740792E−29 1.022008E−27 0.000000E+00 −8.755646E−27 Y¹⁰ 0.000000E+00 0.000000E+00 1.728076E−29 1.964912E−28 0.000000E+00 −7.204080E−27 Nradius 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 Y-decenter −144.660 −98.223 42.173 −14.449 2.986 −10.929 X-rotation −8.868 −16.235 1.500 −3.658 −7.600 −1.635

For the mirrors in projection objective 300, the maximum deviation of the freeform surfaces from a best fit sphere for each mirror is as follows: 154 μm for mirror 310; 43 μm for mirror 320, 240 μm for mirror 330; 1.110 μm for mirror 340; 440 μm for mirror 350; and 712 μm for mirror 360. The maximum deviation of the freeform surfaces from a best fit rotationally symmetric asphere is 47 μm for mirror 310; 33 μm for mirror 320, 96 μm for mirror 330; 35 μm for mirror 340; 152 μm for mirror 350; and 180 μm for mirror 360.

The first and second principal curvature for mirror 310 are 9.51×10⁻⁴ and 9.30×10⁻⁴ respectively. Respective first and second principal curvatures for the other mirrors in projection objective 300 are as follows: 2.76×10⁻⁵ and 1.56×10⁻⁵ for mirror 320; −2.38×10⁻³ and −2.17×10⁻³ for mirror 330; 1.79×10⁻³ and 1.75×10⁻³ for mirror 340; −2.64×10⁻³ and −2.10×10⁻³ for mirror 350; and 1.93×10⁻³ and 1.91×10⁻³ for mirror 360. The sum of the first principal curvature for projection objective 300 is −3.19×10⁻⁴. The sum of the second principal curvature is 3.29×10⁻⁴. The sum of the first and second principal curvatures is 9.97×10⁻⁶ and the inverse sum of the first and second principal curvatures is 1.00×10⁵.

In certain embodiments, the arrangement of mirrors in projection objective 101 images radiation from object plane 103 to one or more intermediate-image planes. For example, projection objective 300 images radiation from object plane 103 to an intermediate image at a location 305 near mirror 360. Embodiments that have one or more intermediate images, also include two or more pupil planes. In some embodiments, at least one of these pupil planes is physically accessible for the purposes of placing an aperture stop substantially at that pupil plane. An aperture stop is used to define the size of the projection objective's aperture.

Coma at an intermediate image in projection objective 101 can be relatively large. Coma can be quantified by the distance between the chief ray and the upper and lower rays at the point where the upper and lower rays cross. In some embodiments, this distance can be about 1 mm or more (e.g., about 2 mm or more, about 3 mm or more, about 4 mm or more, about 5 mm or more, about 6 mm or more, such as about 7 mm) Coma at an intermediate image in projection objective can be relatively small. In some embodiments, the distance can be about 1 mm or less (e.g., about 0.1 mm or less, 0.01 mm or less).

In general, mirrors in projection objective 101 are formed so that they reflect a substantial amount of radiation of wavelength λ normally-incident thereon or incident thereon over a certain range of incident angles. Mirrors can be formed, for example, so that they reflect about 50% or more (e.g., about 60% or more, about 70% or more, about 80% or more, about 90% or more, about 95% or more, 98% or more) of normally incident radiation at λ.

In some embodiments, the mirrors include a multilayer stack of films of different materials arranged to substantially reflect normally incident radiation at λ. Each film in the stack can have an optical thickness of about λ/4. Multilayer stacks can include about 20 or more (e.g., about 30 or more, about 40 or more, about 50 or more) films. In general, the materials used to form the multilayer stacks are selected based on operational wavelength λ. For example, multiple alternating films of molybdenum and silicon or molybdenum and beryllium can be used to form mirrors for reflecting radiation in the 10 nm to 30 nm range (e.g., for λ of about 13 nm or about 11 nm, respectively). Generally, multiple alternating films of molybdenum and silicon can be used for λ=11 nm and multiple alternating films of molybdenum and beryllium can be used for λ=13 nm.

In certain embodiments, the mirrors are made of quartz glass coated with a single layer of aluminum and overcoated with one or more layers of dielectric materials, such as layers formed from MgF₂, LaF₂, or, Al₂O₃. Mirrors formed from aluminum with dielectric coatings can be used, for example, for radiation having a wavelength of about 193 nm.

In general, the percentage of radiation at λ reflected by a mirror varies as a function of the angle of incidence of the radiation on the mirror surface. Because imaged radiation propagates through a catoptric projection objective along a number of different paths, the angle of incidence of the radiation on each mirror can vary. This effect is illustrated with reference to FIG. 4, which shows a portion of a mirror 400, in meridional section, that includes a concave reflective surface 401. Imaged radiation is incident on surface 401 along a number of different paths, including the paths shown by rays 410, 420, and 430. Rays 410, 420, and 430 are incident on portions of surface 401 where the surface normal is different. The direction of surface normal at these portions is shown by lines 411, 421, and 431, corresponding to rays 410, 420, and 430, respectively. Rays 410, 420, and 430 are incident on surface 401 at angles θ₄₁₀, θ₄₂₀, and θ₄₃₀, respectively. In general, angles θ₄₁₀, θ₄₂₀, and θ₄₃₀ may vary.

For each mirror in projection objective 101, the incident angles of imaged radiation can be characterized in a variety of ways. One characterization is the maximum angle of incidence of meridional rays on each mirror in a meridional section of projection objective 101. Meridional rays refer to rays lying in the meridional section. In general, θ_(max) can vary for different mirrors in projection objective 101.

In some embodiments, the maximum value of θ_(max) for all the mirrors in projection objective 101 is about 75° or less (e.g., about 70° or less, about 65° or less, about 60° or less, about 55° or less, about 50° or less, about 45° or less). θ_(max) can be more than about 5° (e.g., about 10° or more, about 20° or more). In some embodiments, the maximum value of θ_(max) can be relatively low. For example, the maximum value of θ_(max) can be about 40° or less (e.g., about 35° or less, about 30° or less, about 25° or less, about 20° or less, about 15° or less, about 13° or less, about 10° or less).

As an example, in projection objective 300, θ_(max) for mirror 310 is 8.22°, θ_(max) for mirror 320 is 10.38°, θ_(max) for mirror 330 is 22.35°, θ_(max) for mirror 340 is 7.49°, θ_(max) for mirror 350 is 24.58°, and θ_(max) for mirror 360 is 6.15°.

In some embodiments, the ratio of the maximum value of θ_(max) (in degrees) to image-side NA can be about 100 or less (e.g., about 80 or less, about 70 or less, 68 or less, about 60 or less, about 50 or less, about 40 or less, about 30 or less).

Another characterization is the angle of incidence of the chief ray corresponding to the central field point on each mirror in a meridional section of projection objective 101. This angle is referred to as θ_(CR). In general, θ_(CR) can vary. For projection objective 300, for example, mirror 310 has θ_(CR) of 6.59°, mirror 320 has θ_(CR) of 7.93°, mirror 330 has θ_(CR) of 20.00°, mirror 340 has θ_(CR) of 7.13°, mirror 350 has θ_(CR) of 13.06°, and mirror 360 has θ_(CR) of 5.02°. In some embodiments the maximum value of θ_(CR), θ_(CR)(max), in projection objective 101 can be relatively low. For example, θ_(CR)(max) can be about 35° or less (e.g., about 30° or less, about 25° or less, about 20° or less, about 15° or less, about 13° or less, about 10° or less, about 8° or less, about 5° or less). For projection objective 300, θ_(CR)(max), which is θ_(CR) for mirror 330, is 20.00°.

In some embodiments, the ratio of the maximum value of θ_(CR(max)) (in degrees) to image-side NA can be about 100 or less (e.g., about 80 or less, about 70 or less, 68 or less, about 60 or less, about 50 or less, about 40 or less, about 30 or less).

Each mirror in projection objective 101 can also be characterized by the range of angles of incidence, Δθ, of rays for a meridional section of projection objective 101. For each mirror, Δθ corresponds to the difference between θ_(max) and θ_(min), where θ_(min) is the minimum angle of incidence of rays on each mirror in a meridional section of projection objective 101. In general, Δθ may vary for each mirror in projection objective 101. For some mirrors, Δθ can be relatively small. For example, Δθ can be about 20° or less (e.g., about 15° or less, about 12° or less, about 10° or less, about 8° or less, about 5° or less, about 3° or less, 2° or less). Alternatively, for some mirrors in projection objective 101, Δθ can be relatively large. For example, Δθ for some mirrors can be about 20° or more (e.g., about 25° or more, about 30° or more, about 35° or more, about 40° or more). For projection objective 300, Δθ_(max) for mirror 310 is 3.34°, Δθ_(max) for mirror 320 is 4.92°, Δθ_(max) for mirror 330 is 5.18°, Δθ_(max) for mirror 340 is 0.98°, Δθ_(max) for mirror 350 is 24.07°, and Δθ_(max) for mirror 360 is 2.77°.

In some embodiments, the maximum value for Δθ, Aθ_(max), for all the mirrors in projection objective 101 can be relatively small. For example, Δθ_(max) can be about 25° or less (e.g., about 20° or less, about 15° or less, about 12° or less, about 10° or less, about 9° or less, about 8° or less, about 7° or less, about 6° or less, about 5° or less, such as 3°). For projection objective 300, Δθ_(max) is 24.07°.

Another way to characterize the radiation path in projection objective 101 is by the chief ray magnification at each mirror, which refers to the quotient of the tangent of the angle between the chief ray (e.g. in the meridional section) and reference axis 105 before and after reflection from each mirror. For example, referring to FIG. 5A where a chief ray 501 diverges from reference axis 105 prior to reflection from a mirror 510, and reflects from mirror 510 back towards reference axis 105, mirror 510 has a positive chief ray angle magnification. Referring to FIG. 5B, alternatively, where a chief ray 502 diverges from reference axis 105 both before and after reflection from a mirror 520, mirror 520 has a negative chief ray angle magnification. In both cases, the chief ray magnification is given by tan(α)/tan(β). In certain embodiments, having multiple mirrors with positive chief ray angle magnification can correspond to relatively large incident angles on one or more mirrors in the projection objective. Accordingly, projection objectives having only one mirror with positive chief ray angle magnification can also exhibit relatively low incident ray angles on the mirrors. For projection objective 300, mirrors 310, 320, 330 and 350 have negative chief ray angle magnifications, while mirror 340 has positive chief ray angle magnification.

The relative spacing of mirrors in projection objective 101 can vary depending on the specific design of the projection objective. Relatively large distances between adjacent mirrors (with respect to the path of the radiation) can correspond to relatively low incident ray angles on the mirrors. In certain embodiments, projection objective 101 can include at least one pair of adjacent mirrors that separated by more than 50% of the projection objective tracklength. For example, in projection objective 300, mirrors 340 and 350 are separated by more than 50% of the projection objective's track length.

In certain embodiments, having a large relative distance, d_(op-1), between the object plane and the first mirror in the radiation path compared to the distance, d_(op-2), between the object plane and the second mirror in the radiation path can also correspond to relatively low incident ray angles on the mirrors. For example, embodiments where d_(op-1)/d_(op-2) is about 2 or more (e.g., about 2.5 or more, about 3 or more, about 3.5 or more, about 4 or more, about 4.5 or more, about 5 or more) can also have relatively low incident ray angles. In projection objective 300, d_(op-1)/d_(op-2) is 2.38.

In general, the footprint size and shape of the mirrors in projection objective 101 can vary. The footprint shape refers to the shape of the mirror projected onto the x-y plane of the local coordinate system of the surface. The footprint of the mirrors can be circular, oval, polygonal (e.g., rectangular, square, hexagonal), or irregular in shape. In embodiments, the footprint is symmetric with respect to the meridional plane of projection objective 101.

In certain embodiments, mirrors can have a footprint with a maximum dimension that is about 1,500 mm or less (e.g., about 1,400 nm or less, about 1,300 mm or less, about 1,200 mm or less, about 1,100 mm or less, about 1,000 mm or less, about 900 mm or less, about 800 mm or less, about 700 mm or less, about 600 mm or less, about 500 mm or less, about 400 mm or less, about 300 mm or less, about 200 mm or less, about 100 mm or less.) Mirrors may have footprint that has a maximum dimension that is more than about 10 mm (e.g., about 20 mm or more, about 50 mm or more).

An example of a mirror 600 with an oval footprint is shown in FIG. 6A. Mirror 600 has a maximum dimension in the x-direction given by M_(x). In embodiments, M_(x) can be about 1,500 mm or less (e.g., about 1,400 nm or less, about 1,300 mm or less, about 1,200 mm or less, about 1,100 mm or less, about 1,000 mm or less, about 900 mm or less, about 800 mm or less, about 700 mm or less, about 600 mm or less, about 500 mm or less, about 400 mm or less, about 300 mm or less, about 200 mm or less, about 100 mm or less). M_(x) can be more than about 10 mm (e.g., about 20 mm or more, about 50 mm or more).

Mirror 600 is symmetric with respect to meridian 601. Mirror 600 has a dimension M_(y) along meridian 601. For mirror 600 M_(y) is smaller than M_(x), however, more generally, M_(y) can be smaller, the same size, or larger than M_(x). In some embodiments, M_(y) is in a range from about 0.1 M_(x) to about M_(x) (e.g., about 0.2 M_(x) or more, about 0.3 M_(x) or more, about 0.4 M_(x) or more, about 0.5 M_(x) or more, about 0.6 M_(x) or more, about 0.7 M_(x) or more about 0.8 M_(x) or more, about 0.9 M_(x) or more). Alternatively, in certain embodiments, M_(y) can be about 1.1 M_(x) or more (e.g., about 1.5 M_(x) or more), such as in a range from about 2 M_(x) to about 10 M_(x). M_(y) can be about 1,000 mm or less (e.g., about 900 mm or less, about 800 mm or less, about 700 mm or less, about 600 mm or less, about 500 mm or less, about 400 mm or less, about 300 mm or less, about 200 mm or less, about 100 mm or less). M_(y) can be more than about 10 mm (e.g., about 20 mm or more, about 50 mm or more).

In projection objective 300, M_(x) and M_(y) for mirror 310 are 303 mm and 139 mm, respectively; M_(x) and M_(y) for mirror 320 are 187 mm and 105 mm, respectively; M_(x) and M_(y) for mirror 330 are 114 mm and 62 mm, respectively; M_(x) and M_(y) for mirror 340 are 299 mm and 118 mm, respectively; M_(x) and M_(y) for mirror 350 are 99 mm and 71 mm, respectively; and M_(x) and M_(y) for mirror 360 are 358 mm and 332 mm, respectively.

In some embodiments, the base of the mirrors may extend beyond the mirror surface (i.e., the portion of the mirror that reflects imaged radiation) in one or more directions. For example, a mirror's base can extend about 10 mm or more (e.g., about 20 mm or more, about 30 mm or more, about 40 mm or more, about 50 mm or more) beyond the optically active surface in the x- and/or y-directions. Mirror base extension can facilitate mounting the mirror in projection objective 101 by providing surfaces that are not optically active that can be attached to mounting apparatus.

Optionally, mirror base extensions should not be in a direction that occludes the radiation path in projection objective 101. The distance between the edge of a mirror and the radiation path as it passes the mirror is related to a parameter referred to as the “freeboard,” which is the minimum distance between the rays closest to a mirror's edge and the rays nearest the mirror's edge that are reflected by the mirror. In some embodiments, projection objective 101 can include one or more mirrors with freeboards of about 20 mm or more (e.g., about 25 mm or more, about 30 mm or more, about 35 mm or more, about 40 mm or more, about 45 mm or more, about 50 mm or more). Large freeboards provide flexibility in mirror fabrication as the projection objective can accommodate an extended mirror base without occlusion of the imaged radiation. However, relatively small freeboards can correspond to low incident ray angles on the mirrors in the projection objective. In some embodiments, projection objective 101 can include one or more mirrors with freeboards of about 15 mm or less (e.g., about 12 mm or less, about 10 mm or less, about 8 mm or less, about 5 mm or less). In certain embodiments, projection objective 101 includes one or more mirrors having a freeboard between 5 mm and 25 mm. For example, in projection objective 300, mirrors 310, 320, 330, 350, and 360 have freeboards between 5 mm and 25 mm.

In general, the thickness of the mirrors in projection objective 101 may vary. Mirror thickness refers to the dimension of the mirror along the z-axis. Mirrors should generally have sufficient thickness to facilitate mounting within the projection objective. Referring to FIG. 6B, the thickness of mirror 600 can be characterized by a maximum thickness, T_(max), and a minimum thickness, T_(min). Typically, the difference between T_(max) and T_(min) will depend on the curvature of the mirror surface and the structure of the mirror's base. In some embodiments, T_(max) is about 200 mm or less (e.g., about 150 mm or less, about 100 mm or less, about 80 mm or less, about 60 mm or less, about 50 mm or less, about 40 mm or less, about 30 mm or less, about 20 mm or less). In certain embodiments, T_(min) is about 1 mm or more (e.g., about 2 mm or more, about 5 mm or more, about 10 mm or more, about 20 mm or more, about 50 mm or more, about 100 mm or more).

In some embodiments, the maximum dimension of any mirror in projection objective is about 1,500 mm or less (e.g., about 1,400 nm or less, about 1,300 mm or less, about 1,200 mm or less, about 1,100 mm or less, about 1,000 mm or less, about 900 mm or less, about 800 mm or less, about 700 mm or less, about 600 mm or less, about 500 mm or less, such as about 300 mm) In certain embodiments, the maximum dimension of any mirror in projection objective is about 10 mm or more (e.g., about 20 mm or more, about 30 mm or more, about 40 mm or more, about 50 mm or more, about 75 mm or more, about 100 mm or more).

In general, the shape of the field of projection objective 101 can vary. In some embodiments, the field has an arcuate shape, such as the shape of a segment of a ring. Referring to FIG. 7A, a ring-segment field 700 can be characterized by an x-dimension, d_(x), a y-dimension, d_(y), and a radial dimension, d_(r). d_(x) and d_(y) correspond to the dimension of the field along the x-direction and y-direction, respectively. d_(r) corresponds to the ring radius, as measured from an axis 705 to the inner boundary of field 700. Ring-segment field 700 is symmetric with respect the y-z plane and indicated by line 710. In general, the sizes of d_(x), d_(y), and d_(r) vary depending on the design of projection objective 101. Typically d_(y) is smaller than d_(x). The relative sizes of field dimensions d_(x), d_(y), and d_(r) at object plane 103 and image plane 102 vary depending on the magnification or demagnification of projection objective 101.

In some embodiments, d_(x) is relatively large at image plane 102. For example, d_(x) at image plane 102 can be more than 1 mm (e.g., about 3 mm or more, about 4 mm or more, about 5 mm or more, about 6 mm or more, about 7 mm or more, about 8 mm or more, about 9 mm or more, about 10 mm or more, about 11 mm or more, about 12 mm or more, about 13 mm or more, about 14 mm or more, about 15 mm or more, about 18 mm or more, about 20 mm or more, about 25 mm or more). d_(x) can be about 100 mm or less (e.g., about 50 mm or less, about 30 mm or less). d_(y) at image plane 102 can be in a range from about 0.5 mm to about 5 mm (e.g., about 1 mm, about 2 mm, about 3 mm, about 4 mm).

Typically, d_(r) at image plane 102 is about 10 mm or more. d_(r) can be, for example, about 15 mm or more (e.g., about 20 mm or more, about 25 mm or more, about 30 mm or more) at image plane 102. In some embodiments, d_(r) can be extremely large (e.g., about 1 m or more, about 5 m or more, about 10 m or more). In certain embodiments, the field is rectangular in shape and d_(r) is infinite. Projection objective 300, for example, has a rectangular field. Specifically, projection objective 300 has a rectangular field with a y-dimension of 2 mm and an x-dimension of 26 mm.

More generally, for other field shapes, projection objective 101 can have a maximum field dimension of more than 1 mm (e.g., about 3 mm or more, about 4 mm or more, about 5 mm or more, about 6 mm or more, about 7 mm or more, about 8 mm or more, about 9 mm or more, about 10 mm or more, about 11 mm or more, about 12 mm or more, about 13 mm or more, about 14 mm or more, about 15 mm or more, about 18 mm or more, about 20 mm or more, about 25 mm or more) at image plane 102. In certain embodiments, projection objective has a maximum field dimension of no more than about 100 mm (e.g., about 50 mm or less, about 30 mm or less).

In some embodiments, the image field shape can correspond (e.g., in one or more dimensions) to the shape of die sites on a wafer that is exposed using projection objective 101. For example, the image field can be shaped to reduce overscan when exposing the wafer. Overscan refers to the need to scan the image field beyond the edge of a die site to expose the entire site. Generally, this occurs where the shape of the image field does not conform to the shape of die site.

Overscan can be characterized by the ratio (e.g., expressed as a percentage) of the maximum distance between the leading edge of the image field and the trailing edge of the die site at the position where the corners at the trailing edge of the die site are exposed. Referring to FIG. 7B, overscan corresponds to the ratio of d_(os) to d_(y), where d_(os) is the distance between the leading edge of image field 700 and the trailing edge of die sites 720 at the position where corners 721 and 722 are exposed. In certain embodiments, projection objective can have relatively low overscan. For example, projection objective can have an overscan of about 5% or less (e.g., about 4% or less, about 3% or less, about 2% or less, about 1% or less, about 0.5% or less, 0.1% or less).

In certain embodiments, projection objective 101 can be used with zero overscan. For example, referring to FIG. 7C, in embodiments where an image field 730 is used to expose square die sites 740, scanning can be achieved with zero overscan.

Referring to FIG. 8A, in general, projection objective 101 introduces an object-image shift, d_(ois), that varies depending on the specific design of the projection objective. The object-image shift refers to the distance of a point in the image field from the corresponding point in the object field, as measured in the x-y plane. For projection objectives that have an optical axis (a common axis of rotational symmetry for each mirror in the projection objective) the object-image shift can be calculated using the formula:

d _(ois) =h _(o)(1−M)

where h_(o) refers to the distance in the x-y plane of the central field point in the object field from the optical axis and M is the projection objective magnification ratio. For example, for a projection objective have a demagnification of 4× (i.e., M=0.25) and where the central field point is 120 mm from the optical axis, d_(ois) is 90 mm.

Projection objective 101 has a relatively small object-image shift. For example, projection objective has zero object-image shift. Projection objectives having relatively small object image shifts can be have a relatively slim optical design. Furthermore, in embodiments that have zero object-image shift, projection objective 101 can be rotated about the axis intersecting the central field points in the object and image fields without the central field point translating with respect to, e.g., stage 130. This can be advantageous where, for example, metrology tools (e.g., detection optical systems, such as those disclosed in U.S. Pat. No. 6,240,158 B1) for inspecting and aligning wafers with respect to projection objective 101 are placed at a nominal position of the central field point because the central field point is not translated with respect to this position when the projection objective rotates. Accordingly, zero object-image shift can facilitate easier metrology and testing of projective objective 101 where the projection objective is subject to rotations during the course of operation.

This is illustrated with respect to FIGS. 8B, 8C, 8D and 8E. FIG. 8B shows a view of the object field and the image field of a projection of objective having a large object-image shift d_(ois). After rotation of the projection objective 101 about a rotation axis coinciding with reference axis 105, an object field 103A in the object plane 103 pivots into an object field position 103B. Accordingly, the respective image field 102A in the image plane 102 pivots to an image field position 102B. A central object field point C_(O) of the object field 103A moves due to this pivoting about rotation axis 105 from a position C_(OA) to a position C_(OB). Accordingly, a central image field point C_(I) moves from a position C_(IA) to a position C. Thus, in the system of FIG. 8B with large object-image shift d_(ois) the central field points C_(O), C_(I) escape a detection region and therefore escape a measurement due to rotation about the rotation axis 105. This is not desirable.

FIG. 8C shows the case, where the object-image shift d_(ois) of the projection objective 101 is zero. In that case, rotation axis 105 intersects the object plane 103 and the image plane 102 at the central field points C_(O), C_(I). During rotation of the projection objective 101 about the rotation axis 105, the central field points C_(O), C_(I) stay within a measurement region. In that case, testing and metrology is facilitated.

FIGS. 8D and 8E depict a dependency of the object-image shift on the numerical aperture of the system which often is observed when comparing different types of projection objectives. FIG. 8D shows schematically a projection objective 101 having a relatively small numerical aperture. In that case, most designs of projection objectives exhibit a relatively small distance h₀ between an axis through the central field point C_(O) and the optical axis OA.

Therefore, also d_(ois) being directly proportional to h₀ can be kept small. FIG. 8E shows the case in a projection objective 101 with high numerical aperture. In this case, the projection objective often exhibits a large distance h₀ between the axis through the central object field point C_(O) and the optical axis OA. Thus, also d_(ois) is larger than in the projection objective of FIG. 8D.

In the projection objectives disclosed herein, high numerical aperture systems are presented having only a small distance h₀ or even h₀=0. In that case, small object-image shifts or zero object-image shifts can be realized with high numerical aperture projection objectives.

In some embodiments, projection objective 101 has a d_(ois) of about 80 mm or less (e.g., about 60 mm or less, about 50 mm or less, about 40 mm or less, about 30 mm or less, about 20 mm or less, about 15 mm or less, about 12 mm or less, about 10 mm or less, about 8 mm or less, about 5 mm or less, about 4 mm or less, about 3 mm or less, about 2 mm or less, about 1 mm or less). Projection objective 300, for example, has a d_(ois) of 57 mm.

Embodiments of projection objective 101 can have a relatively large image-side free working distance. The image-side free working distance refers to the shortest distance between image plane 102 and the mirror surface of the mirror closest to image plane 102 that reflects imaged radiation. This is illustrated in FIG. 9, which shows a mirror 810 as the closest mirror to image plane 102. Radiation reflects from surface 811 of mirror 810. The image-side free working distance is denoted d_(w). In some embodiments, d_(w) is about 25 mm or more (e.g., about 30 mm or more, about 35 mm or more, about 40 mm or more, about 45 mm or more, about 50 mm or more about 55 mm or more, about 60 mm or more, about 65 mm or more). In certain embodiments, d_(w) is about 200 mm or less (e.g., about 150 mm or less, about 100 mm or less, about 50 mm or less). Projection objective 300, for example, has an image-side free working distance of approximately 45 mm. A relatively large working distance may be desirable because it can allow the surface of substrate 150 to be positioned at image plane 102 without contacting the side of mirror 810 facing image plane 102.

Analogously, the object-side free working distance refers to the shortest distance between object plane 103 and the mirror surface of the reflective side of the mirror in projection objective 101 closest to object plane 103 that reflects imaged radiation. In some embodiments, projection objective 101 has a relatively large object-side free working distance. For example, projection objective 101 can have an object-side free working distance of about 50 mm or more (e.g., about 100 mm or more, about 150 mm or more, about 200 mm or more, about 250 mm or more, about 300 mm or more, about 350 mm or more, about 400 mm or more, about 450 mm or more, about 500 mm or more, about 550 mm or more, about 600 mm or more, about 650 mm or more, about 700 mm or more, about 750 mm or more, about 800 mm or more, about 850 mm or more, about 900 mm or more, about 950 mm or more, about 1,000 mm or more). In certain embodiments, the object-side free working distance is no more than about 2,000 mm (e.g., about 1,500 mm or less, about 1,200 mm or less, about 1,000 mm or less). Projection objective 300, for example, has an object-side free working distance of approximately 300 mm. A relatively large object-side free working distance may be advantageous in embodiments where access to the space between projection objective 101 and object plane 103 is desired. For example, in embodiments where reticle 140 is a reflective reticle, it is desirable to illuminate the reticle from the side that faces objective 101. Therefore, there should be sufficient space between projection objective 101 and object plane 103 to allow the reticle to be illuminated by illumination system 120 at a desired illumination angle. Furthermore, in general, a larger object-side free working distance allows flexibility in design of the rest of tool, for example, by providing sufficient space to mount other components (e.g. an uniformity filter) between projection objective 101 and the support structure for reticle 140.

In general, projection objective 101 can be designed so that chief rays either converge, diverge, or are substantially parallel to each other at reticle 140. Correspondingly, the location of the entrance pupil of projection objective 101 with respect to object plane 103 can vary. For example, where chief rays converge at reticle 140, the entrance pupil is located on the image plane side of object plane 103. Conversely, where the chief rays diverge at reticle 140, object plane 103 is located between the entrance pupil and image plane 102. Furthermore, the distance between object plane 103 and the entrance pupil can vary. In some embodiments, the entrance pupil is located about 1 m or more (e.g., about 2 m or more, about 3 m or more, about 4 m or more, about 5 m or more, about 8 m or more, about 10 m or more) from object plane 103 (measured along an axis perpendicular to object plane 103). In some embodiments, the entrance pupil is located at infinity with respect to object plane 103. This corresponds to where the chief rays are parallel to each other at reticle 140. For projection objective 300, the incident angle of the chief ray at the central field point at object plane 103 is 7° and the maximum variation of the chief ray angle form the central field point chief ray is 0.82°. The entrance pupil is located 1,000 mm from object plane 103 on the opposite side of object plane 103 from image plane 102.

Illumination system 120 may be arranged so that the exit pupil of the illumination system is positioned substantially at the entrance pupil of projection objective 101. In certain embodiments, illumination system 120 includes a telescope subsystem which projects the illumination system's exit pupil to the location of the entrance pupil of projection objective 101. However, in some embodiments, the exit pupil of illumination system 120 is positioned at the entrance pupil of projection objective 101 without using a telescope in the illumination system. For example, when the object plane 103 is between projection objective 101 and the entrance pupil of the projection objective, the exit pupil of illumination system 120 may coincide with the projection objective's entrance pupil without using a telescope in the illumination system.

In general, projection objective 101 can be designed using commercially available optical design software like ZEMAX, OSLO, or Code V. Typically, a design is started by specifying an initial projection objective design (e.g., arrangement of mirrors) along with parameters such as the radiation wavelength, field size and numerical aperture, for example. The code then optimizes the design for specified optical performance criteria, such as, for example, wavefront error, distortion, telecentricity, and. field curvature.

In certain embodiments, the initial projection objective is designated by rotationally symmetric mirrors (e.g., spherical or aspherical mirrors) that are centered on an optical axis. Each mirror is then decentered from the optical axis to a position where the mirror satisfies some pre-established criterion. For example, each mirror can be decentered from the optical axis by and amount which minimizes the chief ray angle of incidence across the mirror for particular field. In embodiments, mirrors can be decentered by about 5 mm or more (e.g., about 10 mm or more, about 20 mm or more, about 30 mm or more, about 50 mm or more). In certain embodiments, mirrors are decentered by about 200 mm or less (e.g., about 180 mm or less, about 150 mm or less, about 120 mm or less, about 100 mm or less).

Alternatively, or additionally, each mirror can be tilted to a position where the mirror satisfies some pre-established criterion. The tilt refers to the orientation of each mirrors symmetry axis with respect to the optical axis of the initial configuration of the projection objective. Mirrors can be titled by about 1° or more (e.g., about 2° or more, about 3° or more, about 4° or more, about 5° or more). In some embodiments, mirrors are tilted by about 20° or less (e.g., about 15° or less, about 12° or less, about 10° or less).

After decentering and/or tilting, a freeform shape for each mirror can be determined to optimize the projection objective design for specified optical performance criteria.

In addition to mirrors, projection objective 101 can include one or more other components, such as one or more aperture stops. In general, the shape of the aperture stop can vary. Examples of aperture stops include circular aperture stops, elliptical aperture stops, and/or polygonal aperture stops. Apertures stops can also be positioned so that the image radiation makes a double pass or a single pass through the aperture stop. Aperture stops can be interchanged in projection objective 101 and/or may have an adjustable aperture.

In some embodiments, projection objective 101 includes a field stop. For example, in embodiments where projective objective includes an intermediate image, the field stop can be positioned at or near the intermediate image.

Embodiments can include baffles (e.g., to shield the wafer from stray radiation). In some embodiments, projection objective 101 can include components (e.g., interferometers) for monitoring changes in the position of mirrors within the projection objective. This information can be used to adjust the mirrors to correct for any relative movement between the mirrors. Mirror adjustment can be automated. Examples of systems for monitoring/adjusting mirror position are disclosed in U.S. Pat. No. 6,549,270 B1.

Referring to FIG. 10, an embodiment of a projection objective 1000 includes six mirrors 1010, 1020, 1030, 1040, 1050, and 1060, and has an image-side numerical aperture of 0.35 and an operating wavelength of 13.5 nm. Mirrors 1010, 1020, 1030, 1040, 1050, and 1060 are all freeform mirrors. Projection objective 1000 images radiation from object plane 103 to image plane 102 with a demagnification ratio of 4×. The tracklength of projection objective 1000 is 1497 mm and the optical path length of imaged radiation is 4760 mm. Accordingly, the ratio of the optical path length to tracklength is approximately 3.18. Projection objective 1000 has an aperture stop positioned close to mirror 1020.

The entrance pupil of projection objective 1000 is located 1,000 mm from object plane 103 with object plane positioned between the entrance pupil and the mirrors. Due to the reflective reticle positioned at object plane 103, illumination optics can be positioned at location 1070, corresponding to the entrance pupil. The chief ray angle of the central field point at object plane 103 is 7°. The maximum variation of chief ray angles at object plane 103 is 0.82°.

Projection objective 1000 has a rectangular field. The image-side field width, d_(x), is 26 mm. The image-side field length, d_(y), is 2 mm. Projection objective 1000 has an object-image shift of 13 mm.

The performance of projection objective 1000 includes an image-side W_(rms) of 0.021λ. Distortion is less than 10 nm, and image-side field curvature is 19 nm. Projection objective 1000 provides an intermediate image between mirrors 1040 and 1050. Coma at the intermediate image is relatively large. In particular, the distance between the chief ray and the upper and lower rays at the location where the upper and lower rays cross is 7 mm.

The optical power of the mirrors in the order of the radiation path from object plane 103 to image plane 102 is as follows: mirror 1010 has positive optical power; mirror 1020 has negative optical power; mirror 1030 has positive optical power; mirror 1040 has positive optical power; mirror 1050 has negative optical power; and mirror 1060 has positive optical power.

The dimension of the footprint of each mirror, given as M_(x)×M_(y), is as follows: 323 mm×152 mm for mirror 1010; 107 mm×59 mm for mirror 1020; 297 mm×261 mm for mirror 1030; 277 mm×194 mm for mirror 1040; 99 mm×72 mm for mirror 1050; and 268 mm×243 mm for mirror 1060.

The maximum deviation of mirror 1010 from a best fit sphere is 475 μm. Maximum deviation from best fit spheres of mirrors 1020, 1030, 1040, 1050, and 1060 are 1.234 μm, 995 μm, 1.414 μm, 170 μm, and 416 μm, respectively. The maximum deviation of each mirror from a best fit asphere is 236 μm, 102 μm, 102 μm, 148 μm, 54 μm, and 372 μm for mirrors 1010, 1020, 1030, 1040, 1050, and 1060, respectively.

The first and second principal curvature for mirror 1010 are 1.16×10⁻³ and 1.05×10⁻³ respectively. Respective first and second principal curvatures for the other mirrors in projection objective 1000 are as follows: −3.02×10⁻³ and −1.13×10⁻³ for mirror 1020; 5.97×10⁻⁴ and 4.96×10⁻⁴ for mirror 1030; 5.50×10⁻⁴ and 3.63×10⁻⁴ for mirror 1040; −2.24×10⁻³ and −2.04×10⁻³ for mirror 1050; and 2.57×10⁻³ and 2.48×10⁻³ for mirror 1060. The sum of the first principal curvature for projection objective 1000 is −3.78×10⁻⁴. The sum of the second principal curvature is 1.22×10⁻³. The sum of the first and second principal curvatures is 8.45×10⁻⁴ and the inverse sum of the first and second principal curvatures is 1.18×10³.

The chief ray angle of incidence for the central field point is 3.40°, 9.86°, 6.48°, 10.13°, 13.66°, and 7.00° for mirrors 1010, 1020, 1030, 1040, 1050, and 1060, respectively. The maximum angle of incidence, θ_(max), on each mirror for the meridional section is 3.94°, 10.42°, 7.45°, 14.34°, 24.28°, and 8.61° for mirrors 1010, 1020, 1030, 1040, 1050, and 1060, respectively. Δθ for mirrors 1010, 1020, 1030, 1040, 1050, and 1060 are 1.13°, 2.74°, 3.42°, 9.96°, 23.69°, and 3.95°, respectively.

Mirrors 1010, 1020, 1030, 1050, and 1060 have freeboards that are more than 5 mm and less than 25 mm. Mirror 1030 has positive chief ray angle magnification while mirrors 1040 and 1050 have negative chief ray angle magnification.

The image-side free working distance of projection objective 1000 is 45 mm. The object-side free working distance is 252 mm.

In projection objective 1000, d_(op-1)/d_(op-2) is 3.14. Furthermore, adjacent mirror pairs 1020 and 1030, 1030 and 1040, and 1040 and 1050 are separated by more than 50% of the projection objective's tracklength. Further, the distance between mirror 1010 and object plane 103 is more than 50% of the projection objective's tracklength.

Data for projection objective 1000 is presented in Table 2A and Table 2B below. The parameters and units for the parameters for Table 2A and 2B and subsequent tables are the same as the corresponding parameters and units presented in Table 1A and 1B above. Table 2A presents optical data, while Table 2B presents freeform constants for each of the mirror surfaces. For the purposes of Table 2A and Table 2B, the mirror designations correlate as follows: mirror 1 (M1) corresponds to mirror 1010; mirror 2 (M2) corresponds to mirror 1020; mirror 3 (M3) corresponds to mirror 1030; mirror 4 (M4) corresponds to mirror 1040; mirror 5 (M5) corresponds to mirror 1050; and mirror 6 (M6) corresponds to mirror 1060.

TABLE 2A Surface Radius (mm) Thickness (mm) Mode Object INFINITY 788.884 Mirror 1 −651.356 −537.372 REFL Mirror 2 −463.216 952.014 REFL Mirror 3 −1710.243 −783.854 REFL Mirror 4 1821.345 1032.444 REFL Mirror 5 309.420 −306.504 REFL Mirror 6 405.847 351.549 REFL Image INFINITY 0.000

TABLE 2B Coefficient M1 M2 M3 M4 M5 M6 K −5.925412E−011 1.525505E+00 −1.851822E+00 3.314097E+00 1.983829E+00 2.009323E−01 Y 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X² 2.471303E−04 6.505963E−04 7.593410E−05 2.922157E−05 −4.716078E−04 1.426720E−05 Y² 1.863347E−04 6.677442E−05 −2.868206E−05 −7.428048E−05 −3.446472E−04 5.312976E−05 X²Y −3.545294E−08 −2.891983E−06 1.048420E−07 9.891278E−08 2.877558E−06 −2.714955E−08 Y³ −1.873281E−08 −3.078489E−06 −7.296056E−08 −3.920160E−08 1.288669E−06 −9.898583E−09 X⁴ 1.180642E−11 3.342373E−10 −3.287877E−11 −8.971583E−11 3.862440E−10 −8.982825E−11 X²Y² 3.437144E−11 5.937123E−09 −2.687658E−11 −7.769409E−11 1.693138E−08 2.462964E−11 Y⁴ 9.863178E−11 −2.340521E−08 −1.605207E−10 −1.806038E−10 −2.208217E−09 −3.099379E−11 X⁴Y −4.051355E−14 1.381955E−13 −2.895532E−14 5.170900E−14 4.797213E−11 −4.214964E−14 X²Y³ −2.144219E−13 −2.531232E−10 −1.637831E−13 2.916068E−13 1.961281E−10 −3.785260E−14 Y⁵ −2.415401E−14 1.279499E−10 −7.226386E−14 1.273503E−13 2.976407E−11 4.394992E−14 X⁶ −2.920211E−17 1.949737E−14 −1.774795E−17 −2.785422E−16 8.466233E−14 −5.281246E−16 X⁴Y² 7.135583E−17 −6.187267E−13 −2.447653E−16 −1.867205E−16 3.921385E−13 −5.767253E−16 X²Y⁴ 5.606882E−16 4.378172E−13 −4.812153E−16 4.588123E−16 7.309790E−13 −7.534000E−17 Y⁶ −7.879310E−16 −6.710705E−13 6.992795E−19 3.331795E−16 −3.185164E−13 −9.186437E−17 X⁶Y 2.435160E−20 −3.445743E−16 −3.254844E−19 −4.053237E−18 1.681642E−15 −7.144774E−20 X⁴Y³ −1.325499E−18 2.205904E−15 −4.637731E−19 −1.132243E−18 6.530207E−15 −1.155827E−19 X²Y⁵ 2.538976E−18 7.780251E−15 −5.473994E−19 9.042940E−19 5.583512E−15 1.826925E−19 Y⁷ 6.001333E−18 7.757557E−15 −8.424804E−21 7.805993E−20 −2.390583E−15 3.562442E−19 X⁸ −2.140710E−22 −1.536511E−18 −5.293518E−23 −7.757919E−22 1.098261E−18 −2.871286E−21 X⁶Y² −2.383343E−21 −3.017606E−17 −2.564847E−21 −2.918509E−20 −1.382527E−17 −5.946767E−21 X⁴Y⁴ 4.328735E−21 −3.407893E−17 −3.923348E−22 −6.995732E−21 2.738740E−17 −2.968388E−21 X²Y⁶ −4.831336E−20 −1.206126E−16 −1.673186E−22 5.920827E−22 4.911090E−17 8.147751E−22 Y⁸ −3.800647E−20 −6.246834E−17 −5.575611E−23 −7.691743E−22 −4.049646E−18 −1.438562E−21 X⁸Y 2.973276E−24 6.697817E−20 −9.383994E−25 −1.349984E−23 8.777395E−22 −9.763800E−25 X⁶Y³ 1.179538E−23 5.201215E−19 −6.639018E−24 −8.645373E−23 −3.199889E−19 −4.878981E−24 X⁴Y⁵ −1.203834E−23 −4.705218E−20 −1.462557E−25 −1.508808E−23 8.645921E−20 −3.908340E−24 X²Y⁷ 2.304206E−22 1.208243E−19 2.562699E−25 1.368282E−24 4.649092E−19 2.276452E−24 Y⁹ 1.418250E−22 −1.077428E−19 7.645118E−27 −3.895996E−25 1.402632E−20 5.582547E−24 X¹⁰ 4.021654E−28 2.141815E−23 −3.668876E−27 −1.991462E−26 1.059359E−22 −2.694594E−26 X⁸Y² −1.314266E−26 −8.696134E−22 −1.671744E−27 −3.158518E−26 −2.330392E−22 −7.617267E−26 X⁶Y⁴ −7.356431E−27 −3.656759E−21 −5.748164E−27 −9.269087E−26 −2.103517E−21 −6.065950E−26 X⁴Y⁶ 1.059736E−26 3.564328E−22 −1.527905E−28 −1.292503E−26 −3.644105E−22 1.700246E−26 X²Y⁸ −3.817918E−25 2.574506E−21 1.902672E−28 1.728267E−27 1.530993E−21 1.267011E−26 Y¹⁰ −2.256936E−25 1.804566E−21 1.126083E−29 −2.712119E−28 −1.135939E−22 −1.049025E−26 Nradius 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 Y-decenter −141.222 −91.036 45.162 −4.535 −0.554 −8.496 X-rotation −9.184 −15.081 1.443 −3.391 −6.975 −1.780

Referring to FIG. 11, an embodiment of a projection objective 1000 includes six mirrors 1110, 1120, 1130, 1140, 1150, and 1160, and has an image-side numerical aperture of 0.35 and an operating wavelength of 13.5 nm. Mirrors 1110, 1120, 1130, 1140, 1150, and 1160 are all freeform mirrors. Projection objective 1100 images radiation from object plane 103 to image plane 102 with a demagnification ratio of 4×. The tracklength of projection objective 1100 is 2000 mm and the optical path length of imaged radiation is 5337 mm. Accordingly, the ratio of the optical path length to tracklength is approximately 2.67. Projection objective 1100 has an aperture stop 1106 positioned at mirror 1120.

The entrance pupil of projection objective 1100 is located at infinity with object plane positioned between the entrance pupil and the mirrors. The chief ray angle of the central field point at object plane 103 is 7°. The maximum variation of chief ray angles at object plane 103 is less than 0.06°.

Projection objective 1100 has a rectangular field. The image-side field width, d_(x), is 26 mm. The image-side field length, d_(y), is 2 mm. Projection objective 1100 has an object-image shift of 31 mm.

The performance of projection objective 1100 includes an image-side W_(rms) of 0.025λ. Image-side field curvature is 10 nm. Projection objective 1100 provides an intermediate image between mirrors 1140 and 1150.

The optical power of the mirrors in the order of the radiation path from object plane 103 to image plane 102 is as follows: mirror 1110 has positive optical power; mirror 1120 has positive optical power; mirror 1130 has negative optical power; mirror 1140 has positive optical power; mirror 1150 has negative optical power; and mirror 1160 has positive optical power.

The dimension of the footprint of each mirror, given as M_(x)×M_(y), is as follows: 291 mm×195 mm for mirror 1110; 159 mm×152 mm for mirror 1120; 157 mm×53 mm for mirror 1130; 295 mm×66 mm for mirror 1140; 105 mm×86 mm for mirror 1150; and 345 mm×318 mm for mirror 1160.

The chief ray angle of incidence for the central field point is 4.38°, 4.03°, 18.37°, 7.74°, 12.64°, and 5.17° for mirrors 1110, 1120, 1130, 1140, 1150, and 1160, respectively. The maximum angle of incidence, θ_(max), on each mirror for the meridional section is 6.48°, 6.44°, 20.05°, 9.12°, 21.76°, and 7.22° for mirrors 1110, 1120, 1130, 1140, 1150, and 1160, respectively. Δθ for mirrors 1110, 1120, 1130, 1140, 1150, and 1160 are 4.27°, 4.92°, 4.09°, 3.12°, 19.37°, and 4.61°, respectively.

Mirrors 1110, 1150, and 1160 have freeboards that are more than 5 mm and less than 25 mm. Mirror 1140 has positive chief ray angle magnification while mirrors 1110, 1120, 1130, and 1150 have negative chief ray angle magnification.

The image-side free working distance of projection objective 1100 is 25 mm. The object-side free working distance is 163 mm.

In projection objective 1100, d_(op-1)/d_(op-2) is 6.57. Furthermore, adjacent mirror pair 1040 and 1050 are separated by more than 50% of the projection objective's tracklength. Further, the distance between mirror 1110 and object plane 103 is more than 50% of the projection objective's tracklength.

Data for projection objective 1100 is presented in Table 3A and Table 3B below. Table 3A presents optical data, while Table 3B presents aspherical constants for each of the mirror surfaces. For the purposes of Table 3A and Table 3B, the mirror designations correlate as follows: mirror 1 (M1) corresponds to mirror 1110; mirror 2 (M2) corresponds to mirror 1120; mirror 3 (M3) corresponds to mirror 1130; mirror 4 (M4) corresponds to mirror 1140; mirror 5 (M5) corresponds to mirror 1150; and mirror 6 (M6) corresponds to mirror 1160.

TABLE 3A Surface Radius (mm) Thickness (mm) Mode Object INFINITY 1070.002 Mirror 1 −2069.710 −907.121 REFL Mirror 2 1710.596 0.000 REFL STOP INFINITY 907.500 Mirror 3 414.111 −319.107 REFL Mirror 4 618.022 1223.709 REFL Mirror 5 406.139 −436.552 REFL Mirror 6 522.609 461.570 REFL Image INFINITY 0.000

TABLE 3B Coefficient M1 M2 M3 M4 M5 M6 K −2.012543E+00 −7.790981E+00 −9.061196E−01 −4.714699E−01 5.253415E+00 1.051556E−01 Y −1.801229E−01 −2.676895E−01 6.249715E−03 2.914352E−02 3.699848E−02 6.762162E−04 X² −3.718177E−05 −1.568640E−04 −4.213586E−04 −1.680785E−04 −6.132874E−05 2.479745E−06 Y² −5.757281E−05 −1.359112E−04 −3.015850E−04 −9.908817E−05 −6.383717E−05 1.909227E−06 X²Y −3.283304E−08 −1.421641E−07 −4.802304E−08 −4.234719E−08 5.460366E−07 −5.398408E−09 Y³ −7.289267E−08 −9.447144E−08 3.714670E−07 1.405667E−07 2.644773E−08 −4.741511E−09 X⁴ −3.792148E−11 2.173390E−10 −8.723035E−10 −2.377992E−11 1.030821E−09 −1.926536E−11 X²Y² −1.087876E−10 5.689855E−10 −5.959943E−10 −4.401654E−10 2.045233E−09 −4.586698E−11 Y⁴ −1.237594E−10 2.990476E−10 8.549602E−10 −4.022663E−11 5.551510E−11 −2.632066E−11 X⁴Y −3.587007E−14 −1.028868E−12 −8.033093E−12 1.716353E−13 5.551826E−12 −2.577816E−14 X²Y³ 8.925822E−14 4.492952E−13 −1.186636E−12 −7.545064E−13 −4.309344E−12 −1.775797E−14 Y⁵ −7.423435E−14 5.791519E−13 8.705928E−14 −2.700779E−13 −7.302230E−12 −9.309635E−15 X⁶ 1.876383E−17 2.916278E−16 −2.307341E−14 −1.670466E−15 8.878140E−15 −3.351380E−17 X⁴Y² −3.009967E−16 −3.620666E−16 −2.232847E−14 1.589023E−15 4.463758E−14 −1.408427E−16 X²Y⁴ 1.992400E−16 3.916129E−16 1.756497E−15 3.477633E−16 1.478648E−13 −1.372823E−16 Y⁶ 8.315953E−18 −6.580116E−16 8.232062E−16 1.253553E−16 3.691569E−14 −3.799352E−17 X⁶Y −2.621825E−20 −1.237101E−17 −3.125465E−16 −7.682746E−18 3.293829E−16 −1.214309E−19 X⁴Y³ −1.344388E−18 3.730815E−17 1.376670E−16 5.918289E−18 8.409538E−16 5.369262E−20 X²Y⁵ −6.157858E−19 3.202677E−17 4.387074E−19 2.707480E−18 4.875870E−16 −1.363873E−20 Y⁷ 2.770009E−20 8.487049E−18 2.518948E−18 1.820744E−19 1.274511E−16 2.776746E−21 X⁸ 2.265356E−23 −1.881878E−20 6.916970E−19 3.815768E−20 −1.030207E−19 −2.085793E−23 X⁶Y² −1.848041E−22 −1.667898E−19 −1.070800E−18 1.947584E−20 −6.071205E−19 −1.191227E−22 X⁴Y⁴ −1.617091E−21 −4.471313E−20 −2.039154E−19 −1.469302E−21 8.581801E−18 −2.848570E−22 X²Y⁶ −1.152811E−21 −1.417078E−19 −4.885470E−20 8.329380E−22 2.867618E−18 8.073429E−24 Y⁸ 5.021474E−23 −1.270497E−20 −2.834042E−20 −1.011971E−21 1.813992E−18 −6.757839E−23 X⁸Y 0.000000E+00 0.000000E+00 7.973679E−21 2.492982E−22 0.000000E+00 −2.465296E−25 X⁶Y³ 0.000000E+00 0.000000E+00 7.629111E−22 1.401277E−22 0.000000E+00 2.930653E−25 X⁴Y⁵ 0.000000E+00 0.000000E+00 −7.196032E−21 −4.219890E−23 0.000000E+00 1.194933E−25 X²Y⁷ 0.000000E+00 0.000000E+00 −1.090375E−22 −3.791571E−24 0.000000E+00 5.412579E−25 Y⁹ 0.000000E+00 0.000000E+00 −5.080252E−23 1.076602E−24 0.000000E+00 3.891280E−26 X¹⁰ 0.000000E+00 0.000000E+00 −6.129418E−25 −1.289913E−27 0.000000E+00 0.000000E+00 X⁸Y² 0.000000E+00 0.000000E+00 2.295090E−23 4.078311E−25 0.000000E+00 0.000000E+00 X⁶Y⁴ 0.000000E+00 0.000000E+00 5.951785E−24 1.728297E−25 0.000000E+00 0.000000E+00 X⁴Y⁶ 0.000000E+00 0.000000E+00 −1.732732E−23 −5.280557E−26 0.000000E+00 0.000000E+00 X²Y⁸ 0.000000E+00 0.000000E+00 0.000000E+00 −1.410994E−27 0.000000E+00 0.000000E+00 Y¹⁰ 0.000000E+00 0.000000E+00 0.000000E+00 3.484416E−27 0.000000E+00 0.000000E+00 Nradius 1.000000E+00 1.000000E+00 1.000000E+00 1.000000E+00 1.000000E+00 1.000000E+00 Y-decenter 194.936 −49.734 36.609 9.442 30.019 40.956 X-rotation −5.944 −17.277 −5.569 −0.579 0.301 −0.924

Referring to FIG. 12, an embodiment of a projection objective 1200 includes six mirrors 1210, 1220, 1230, 1240, 1250, and 1260, and has an image-side numerical aperture of 0.35 and an operating wavelength of 13.5 nm. Mirrors 1210, 1220, 1230, 1240, 1250, and 1260 are all freeform mirrors. Projection objective 1200 images radiation from object plane 103 to image plane 102 with a demagnification ratio of 4×. A reference axis 1205, orthogonal to object plane 103 and image plane 102 intersects corresponding field points in the object and image fields. The tracklength of projection objective 1200 is 1385 mm and the optical path length of imaged radiation is 4162 mm. Accordingly, the ratio of the optical path length to tracklength is approximately 3.01. Projection objective 1200 has an aperture stop positioned at mirror 1220.

The entrance pupil of projection objective 1200 is at infinity with object plane positioned between the entrance pupil and the mirrors. The chief ray angle of the central field point at object plane 103 is 7°. The maximum variation of chief ray angles at object plane 103 is less than 0.06°.

Projection objective 1200 has a rectangular field. The image-side field width, d_(x), is 26 mm. The image-side field length, d_(y), is 2 mm. Projection objective 1200 has zero object-image shift.

Projection objective 1200 provides an intermediate image between mirrors 1240 and 1250.

The optical power of the mirrors in the order of the radiation path from object plane 103 to image plane 102 is as follows: mirror 1210 has positive optical power; mirror 1220 has negative optical power; mirror 1230 has positive optical power; mirror 1240 has positive optical power; mirror 1250 has negative optical power; and mirror 1260 has positive optical power.

The dimension of the footprint of each mirror, given as M_(x)×M_(y), is as follows: 250 mm×153 mm for mirror 1210; 70 mm×69 mm for mirror 1020; 328 mm×153 mm for mirror 1230; 325 mm×112 mm for mirror 1240; 87 mm×75 mm for mirror 1250; and 269 mm×238 mm for mirror 1260.

The chief ray angle of incidence for the central field point is 6.13°, 10.61°, 8.65°, 8.26°, 14.22°, and 5.23° for mirrors 1210, 1220, 1230, 1240, 1250, and 1260, respectively. The maximum angle of incidence, θ_(max), on each mirror for the meridional section is 6.53°, 11.63°, 8.91°, 11.39°, 24.26°, and 7.44° for mirrors 1210, 1220, 1230, 1240, 1250, and 1260, respectively. Δθ for mirrors 1210, 1220, 1230, 1240, 1250, and 1260 are 1.07°, 3.64°, 1.74°, 7.44°, 21.70°, and 4.51°, respectively.

Mirrors 1210, 1220, 1250, and 1260 have freeboards that are more than 5 mm and less than 25 mm. Mirror 1240 has positive chief ray angle magnification while mirrors 1210, 1220, 1230, and 1250 have negative chief ray angle magnification.

The image-side free working distance of projection objective 1200 is 40 mm. The object-side free working distance is 439 mm.

In projection objective 1200, d_(op-1)/d_(op-2) is 1.91. Furthermore, adjacent mirror pair 1240 and 1250 are separated by more than 50% of the projection objective's tracklength. Further, the distance between mirror 1210 and object plane 103 is more than 50% of the projection objective's tracklength.

Data for projection objective 1200 is presented in Table 4A and Table 4B below. Table 4A presents optical data, while Table 4B presents aspherical constants for each of the mirror surfaces. For the purposes of Table 4A and Table 4B, the mirror designations correlate as follows: mirror 1 (M1) corresponds to mirror 1210; mirror 2 (M2) corresponds to mirror 1220; mirror 3 (M3) corresponds to mirror 1230; mirror 4 (M4) corresponds to mirror 1240; mirror 5 (M5) corresponds to mirror 1250; and mirror 6 (M6) corresponds to mirror 1260.

TABLE 4A Surface Radius (mm) Thickness (mm) Mode Object INFINITY 836.375 Mirror 1 −614.878 −397.397 REFL Mirror 2 −383.358 0.000 REFL STOP INFINITY 655.992 Mirror 3 −1204.989 −659.631 REFL Mirror 4 1885.915 909.840 REFL Mirror 5 302.954 −308.805 REFL Mirror 6 403.492 348.850 REFL Image INFINITY 0.000

TABLE 4B Coefficient M1 M2 M3 M4 M5 M6 K −6.673329E−01 −2.825442E−01 −1.843864E+00 2.076932E+00 3.340547E+00 1.990979E−01 Y −5.045837E−02 2.263660E−01 −1.277806E−01 −3.310548E−02 −1.935522E−01 1.783092E−02 X² 1.827144E−04 1.686990E−04 9.963384E−05 5.203052E−05 −3.849892E−04 3.792405E−05 Y² 1.737812E−04 2.093994E−04 −1.747764E−05 −7.184095E−05 −3.329705E−04 1.662759E−05 X²Y 4.765150E−08 −1.595967E−06 −5.515151E−08 −8.752119E−10 1.213426E−06 5.552151E−08 Y³ 5.091508E−08 −1.231538E−06 −1.294839E−07 −1.939381E−07 1.502735E−06 9.165146E−08 X⁴ −4.718889E−11 −6.941238E−09 −7.002011E−11 −5.996832E−11 −2.342602E−09 9.552648E−12 X²Y² −4.340357E−11 −7.827867E−09 −1.801185E−10 −7.139217E−11 −1.234047E−08 −1.611525E−10 Y⁴ 1.234053E−10 −3.130174E−09 −7.281275E−11 −1.598859E−10 −1.206604E−08 −1.662004E−10 X⁴Y 1.205203E−13 −6.495768E−11 −3.614883E−14 −4.344276E−14 2.268270E−11 2.930397E−13 X²Y³ 2.259661E−13 −4.304439E−11 −1.048629E−13 −7.811421E−16 2.977954E−11 8.493936E−13 Y⁵ −5.198478E−13 −1.485266E−11 5.022687E−15 −1.422459E−14 −1.556209E−11 4.051187E−13 X⁶ −1.306395E−16 −4.159695E−14 0.000000E+00 −3.767576E−17 1.374773E−14 −9.890588E−17 X⁴Y² 8.838986E−17 1.462867E−14 0.000000E+00 −1.369883E−16 −3.320990E−13 −1.312584E−15 X²Y⁴ −1.745854E−16 4.353978E−13 0.000000E+00 −7.920443E−17 −1.008910E−13 −2.069868E−15 Y⁶ 1.020155E−15 −1.927189E−13 0.000000E+00 −3.431888E−17 −9.148646E−14 −6.650861E−16 X⁶Y 1.090627E−19 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 1.607288E−18 X⁴Y³ −4.158749E−19 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 4.652411E−18 X²Y⁵ −1.758731E−18 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 4.087290E−18 Y⁷ −3.081679E−18 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 9.802736E−19 X⁸ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁶Y² 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁴Y⁴ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X²Y⁶ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 Y⁸ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁸Y 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁶Y³ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁴Y⁵ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X²Y⁷ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 Y⁹ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X¹⁰ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁸Y² 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁶Y⁴ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁴Y⁶ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X²Y⁸ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 Y¹⁰ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 Nradius 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 Y-decenter −118.847 −100.000 100.000 24.472 −11.760 −37.772 X-rotation −7.782 7.388 1.406 −2.140 −8.177 6.989

Referring to FIG. 13, an embodiment of a projection objective 1400 includes six mirrors 1410, 1420, 1430, 1440, 1450, and 1460, and has an image-side numerical aperture of 0.40 and an operating wavelength of 13.5 nm. Mirrors 1410, 1420, 1430, 1440, 1450, and 1460 are all freeform mirrors. Projection objective 1400 images radiation from object plane 103 to image plane 102 with a demagnification ratio of 4×. The tracklength of projection objective 1400 is 1498 mm and the optical path length of imaged radiation is 3931 mm. Accordingly, the ratio of the optical path length to tracklength is approximately 2.62. Projection objective 1400 has an aperture stop positioned between mirrors 1420 and 1430.

The entrance pupil of projection objective 1400 is located 1,000 mm from object plane 103 with object plane positioned between the entrance pupil and the mirrors. The chief ray angle of the central field point at object plane 103 is 7°. The maximum variation of chief ray angles at object plane 103 is 0.82°.

Projection objective 1400 has a rectangular field. The image-side field width, d_(x), is 26 mm. The image-side field length, d_(y), is 2 mm. Projection objective 1000 has an object-image shift of 38 mm.

The performance of projection objective 1000 includes an image-side W_(rms) of 0.083λ. Distortion is approximately 100 nm, and image-side field curvature is 36 nm. Projection objective 1400 provides an intermediate image between mirrors 1440 and 1450.

The optical power of the mirrors in the order of the radiation path from object plane 103 to image plane 102 is as follows: mirror 1410 has positive optical power; mirror 1420 has positive optical power; mirror 1430 has negative optical power; mirror 1440 has positive optical power; mirror 1050 has negative optical power; and mirror 1460 has positive optical power.

The dimension of the footprint of each mirror, given as M_(x)×M_(y), is as follows: 326 mm×159 mm for mirror 1410; 210 mm×123 mm for mirror 1420; 120 mm×66 mm for mirror 1430; 312 mm×119 mm for mirror 1440; 112 mm×83 mm for mirror 1450; and 405 mm×379 mm for mirror 1460.

The chief ray angle of incidence for the central field point is 6.70°, 8.08°, 20.41°, 6.68°, 14.52°, and 5.67° for mirrors 1410, 1420, 1430, 1440, 1450, and 1460, respectively. The maximum angle of incidence, θ_(max), on each mirror for the meridional section is 8.61°, 10.91°, 21.98°, 7.41°, 27.19°, and 6.86° for mirrors 1410, 1420, 1430, 1440, 1450, and 1460, respectively. Δθ for mirrors 1410, 1420, 1430, 1440, 1450, and 1460 are 3.92°, 5.69°, 3.82°, 1.79°, 26.83°, and 3.20°, respectively.

Mirrors 1410, 1420, 1430, 1450, and 1460 have freeboards that are more than 5 mm and less than 25 mm. Mirror 1440 has positive chief ray angle magnification while mirrors 1410, 1420, 1430, and 1450 have negative chief ray angle magnification.

The image-side free working distance of projection objective 1400 is 45 mm. The object-side free working distance is 291 mm.

In projection objective 1400, d_(op-1)/d_(op-2) is 2.47. Furthermore, adjacent mirror pair 1440 and 1450 is separated by more than 50% of the projection objective's tracklength.

Data for projection objective 1400 is presented in Table 6A and Table 6B below. Table 6A presents optical data, while Table 6B presents aspherical constants for each of the mirror surfaces. For the purposes of Table 6A and Table 6B, the mirror designations correlate as follows: mirror 1 (M1) corresponds to mirror 1010; mirror 2 (M2) corresponds to mirror 1020; mirror 3 (M3) corresponds to mirror 1030; mirror 4 (M4) corresponds to mirror 1040; mirror 5 (M5) corresponds to mirror 1050; and mirror 6 (M6) corresponds to mirror 1060.

TABLE 6A Surface Radius (mm) Thickness (mm) Mode Object INFINITY 719.154 Mirror 1 −1768.086 −427.871 REFL Mirror 2 2334.525 575.634 REFL Mirror 3 352.553 −347.888 REFL Mirror 4 610.853 933.638 REFL Mirror 5 431.588 −434.965 REFL Mirror 6 521.464 479.940 REFL Image INFINITY 0.000

TABLE 6B Coefficient M1 M2 M3 M4 M5 M6 K −7.735395E+00 −6.005799E+01 −3.751432E−01 −8.758413E−01 6.604547E+00 8.612526E−02 Y 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X² −1.485069E−04 −1.263679E−04 −2.624294E−04 1.347923E−05 −1.388138E−04 −6.931036E−06 Y² −1.726040E−04 −1.711814E−04 −1.005287E−03 −3.665045E−05 1.295215E−04 8.615161E−06 X²Y −5.200823E−08 −4.156617E−07 7.669496E−07 −5.478449E−08 9.580682E−07 −4.043887E−09 Y³ −3.734392E−08 −4.637041E−08 −5.212076E−07 4.563436E−08 1.158899E−07 −6.370253E−09 X⁴ −1.602036E−10 1.080674E−09 −1.784900E−08 3.290440E−10 2.227159E−09 −4.223672E−11 X²Y² −5.655636E−10 1.150736E−09 9.356049E−09 −1.772824E−10 7.086270E−09 −3.649540E−11 Y⁴ 7.840007E−11 1.816509E−09 1.947612E−09 9.043201E−10 3.962050E−09 5.321857E−12 X⁴Y −9.204024E−14 2.366905E−12 −2.677935E−11 −8.314955E−13 −1.528996E−11 2.788263E−15 X²Y³ 1.079182E−12 3.100338E−12 3.708016E−11 −5.930044E−12 −2.181691E−11 −3.366047E−14 Y⁵ −4.579479E−13 −6.879640E−12 −4.466462E−13 9.529833E−13 −2.295402E−11 −2.906642E−14 X⁶ 6.241273E−17 −3.829664E−15 1.521283E−13 1.097127E−15 −3.501249E−14 −6.862154E−17 X⁴Y² 1.666766E−15 1.243647E−14 5.320614E−14 7.533431E−16 8.652054E−14 −1.407857E−16 X²Y⁴ −2.345440E−15 2.162639E−15 −5.453363E−14 −1.396841E−14 4.036247E−13 1.131588E−17 Y⁶ −3.012261E−15 −1.224080E−14 −1.034267E−14 9.519542E−16 1.105527E−13 3.923271E−17 X⁶Y 3.484859E−18 −9.656525E−18 −6.882044E−16 7.124323E−18 8.790794E−16 2.032080E−20 X⁴Y³ −2.997302E−18 −1.020453E−16 −4.147278E−16 1.059357E−17 9.581262E−16 −8.784820E−20 X²Y⁵ 3.436846E−18 2.303857E−17 −1.104525E−16 −1.635704E−17 −1.619074E−15 −2.001426E−19 Y⁷ 1.247042E−17 1.643841E−16 4.675424E−17 −7.809506E−19 −3.824576E−15 −5.405817E−20 X⁸ 6.566049E−22 4.616940E−20 −8.583253E−18 1.135128E−21 −4.651481E−19 −3.090479E−22 X⁶Y² −1.894284E−20 −2.084017E−19 −4.140672E−18 3.271179E−20 −2.096068E−17 −7.650033E−22 X⁴Y⁴ −4.216883E−21 −3.239553E−19 −3.670866E−18 4.460462E−20 −8.776559E−17 −1.201625E−22 X²Y⁶ −2.826171E−21 −3.920562E−19 3.151001E−20 7.969094E−21 −5.615799E−17 3.016401E−22 Y⁸ −1.315593E−20 −3.058425E−19 2.416437E−20 8.284460E−22 −1.006196E−17 1.721317E−22 X⁸Y −9.935149E−25 −5.168771E−24 −2.316832E−20 −2.523681E−24 1.540486E−20 −3.155606E−26 X⁶Y³ 3.001708E−23 1.226818E−21 −2.812819E−21 3.078069E−23 −1.510545E−19 −4.150182E−25 X⁴Y⁵ 7.941504E−24 1.371322E−21 −5.440197E−21 3.362723E−23 −6.912241E−19 −2.930215E−25 X²Y⁷ −9.194045E−25 7.101398E−22 4.152263E−22 1.093452E−23 −4.418575E−19 3.377883E−25 Y⁹ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X¹⁰ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁸Y² 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁶Y⁴ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁴Y⁶ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X²Y⁸ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 Y¹⁰ 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 Nradius 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 Y-decenter −182.329 −165.907 121.386 20.437 21.141 28.282 X-rotation −10.857 −0.974 −13.061 −5.217 −2.314 −0.850

Referring to FIG. 14, projection objective 1400 can be used in an optical system 1401 that includes a light source 1405 and illumination optics including a collector unit 1415, a spectral purity filter 1425, a field facet mirror 1435 and a pupil facet mirror 1445. Light source 1405 is an EUV light source configured to provide radiation at 13.5 nm to the projection objective. Collector unit 1415 gathers radiation from source 1405 and directs the radiation towards spectral purity filter 1415 which filters incident radiation at wavelengths other than 13.5 nm and directs the radiation at 13.5 nm towards field facet mirror 1435. Together with pupil facet mirror 1445, field facet mirror illuminates a reflective reticle positioned at object plane 103 with radiation at 13.5 nm. The radiation is provided so that the chief rays diverge from the reticle. The radiation is provided to the reticle in this way without the use of additional components, such as a grazing incidence mirror.

Referring to FIG. 15, an embodiment of a projection objective 1500 includes six mirrors 1510, 1520, 1530, 1540, 1550, and 1560, and has an image-side numerical aperture of 0.40 and an operating wavelength of 13.5 nm. Mirrors 1510, 1520, 1530, 1540, 1550, and 1460 are all freeform mirrors. Projection objective 1500 images radiation from object plane 103 to image plane 102 with a demagnification ratio of 4×. The tracklength of projection objective 1500 is 1499 mm and the optical path length of imaged radiation is 4762 mm. Accordingly, the ratio of the optical path length to tracklength is approximately 3.18. Projection objective 1500 has an aperture stop positioned close to mirror 1520.

The entrance pupil of projection objective 1500 is located 1,000 mm from object plane 103 with object plane positioned between the entrance pupil and the mirrors. Due to the reflective reticle positioned at object plane 103, illumination optics can be positioned at location 1501, corresponding to the entrance pupil. The chief ray angle of the central field point at object plane 103 is 7°. The maximum variation of chief ray angles at object plane 103 is 0.82°.

Projection objective 1500 has a rectangular field. The image-side field width, d_(x), is 26 mm. The image-side field length, d_(y), is 2 mm. Projection objective 1500 has an object-image shift of 7 mm.

The performance of projection objective 1500 includes an image-side W_(rms) of 0.040λ. Referring also to FIG. 16A, distortion is less than about 3 nm across the image field. Image-side field curvature is 35 nm. Projection objective 1500 provides an intermediate image between mirrors 1540 and 1550. Referring to FIG. 16B, the chief rays are orthogonal to image plane 102 to within about 0.001 rad)(0.06° at the image field.

The optical power of the mirrors in the order of the radiation path from object plane 103 to image plane 102 is as follows: mirror 1510 has positive optical power; mirror 1520 has negative optical power; mirror 1530 has positive optical power; mirror 1540 has positive optical power; mirror 1550 has negative optical power; and mirror 1560 has positive optical power.

The dimension of the footprint of each mirror, given as M_(x)×M_(y), is as follows: 253 mm×162 mm for mirror 1510; 105 mm×66 mm for mirror 1520; 227 mm×301 mm for mirror 1530; 182 mm×220 mm for mirror 1540; 111 mm×85 mm for mirror 1550; and 289 mm×275 mm for mirror 1560.

The chief ray angle of incidence for the central field point is 3.96°, 12.21°, 7.51°, 11.98°, 15.82°, and 8.08° for mirrors 1510, 1520, 1530, 1540, 1550, and 1560, respectively. The maximum angle of incidence, θ_(max), on each mirror for the meridional section is 4.47°, 12.81°, 8.55°, 16.91°, 27.68°, and 9.96° for mirrors 1510, 1520, 1530, 1540, 1550, and 1560, respectively. Δθ for mirrors 1510, 1520, 1530, 1540, 1550, and 1560 are 1.10°, 3.61°, 4.19°, 12.12°, 27.17°, and 4.79°, respectively.

Mirrors 1510, 1520, 1540, 1550, and 1560 have freeboards that are more than 5 mm and less than 25 mm. Mirror 1530 has positive chief ray angle magnification while mirrors 1510, 1520, 1540, and 1550 have negative chief ray angle magnification.

The image-side free working distance of projection objective 1500 is 45 mm. The object-side free working distance is 260 mm.

In projection objective 1500, d_(op-1)/d_(op-2) is 3.05. Furthermore, adjacent mirror pairs 1520 and 1530, 1530 and 1540, and 1540 and 1550 are separated by more than 50% of the projection objective's tracklength. Further, the distance between mirror 1510 and object plane 103 is more than 50% of the projection objective's tracklength.

Data for projection objective 1500 is presented in Table 7A and Table 7B below. Table 7A presents optical data, while Table 7B presents aspherical constants for each of the mirror surfaces. For the purposes of Table 7A and Table 7B, the mirror designations correlate as follows: mirror 1 (M1) corresponds to mirror 1510; mirror 2 (M2) corresponds to mirror 1520; mirror 3 (M3) corresponds to mirror 1530; mirror 4 (M4) corresponds to mirror 1540; mirror 5 (M5) corresponds to mirror 1550; and mirror 6 (M6) corresponds to mirror 1560.

TABLE 7A Surface Radius (mm) Thickness (mm) Mode Object INFINITY 793.452 Mirror 1 −652.351 −533.717 REFL Mirror 2 −459.234 946.263 REFL Mirror 3 −1711.458 −789.999 REFL Mirror 4 1814.404 1037.812 REFL Mirror 5 310.131 −304.837 REFL Mirror 6 407.712 349.882 REFL Image INFINITY 0.000

TABLE 7B Coefficient M1 M2 M3 M4 M5 M6 K −5.917992E−01 1.401977E+00 −1.852312E+00 3.134672E+00 1.276852E+00 2.162747E−01 Y 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X² 2.486175E−04 6.462590E−04 8.097144E−05 3.683589E−05 −5.694587E−04 1.127522E−05 Y² 1.796052E−04 −1.218131E−05 −3.272168E−05 −7.479058E−05 −3.798909E−04 5.142215E−05 X²Y −3.704365E−08 −3.061838E−06 1.166808E−07 1.073313E−07 3.054784E−06 −1.901527E−08 Y³ −8.473076E−09 −4.336504E−06 −6.831514E−08 −2.680850E−08 1.944165E−06 2.077407E−09 X⁴ 1.525482E−11 2.440415E−10 −2.839993E−11 −8.352784E−11 1.477727E−09 −1.231925E−10 X²Y² 4.909383E−11 1.819997E−09 −2.639958E−11 −7.953809E−11 1.884598E−08 −4.030921E−11 Y⁴ 7.241758E−11 −1.924132E−08 −1.611187E−10 −1.805904E−10 2.829058E−09 −6.788132E−11 X⁴Y −3.944773E−14 −3.384346E−12 4.634420E−14 1.089774E−13 4.746215E−11 7.092901E−15 X²Y³ −2.485019E−13 −1.985647E−10 −1.749321E−13 2.706968E−13 1.878106E−10 7.623271E−14 Y⁵ −6.222758E−14 1.546404E−10 −7.306272E−14 1.121470E−13 2.713089E−11 1.059625E−13 X⁶ −2.853060E−17 1.499373E−14 −3.327224E−16 −3.396117E−16 1.122966E−13 −7.141998E−16 X⁴Y² 5.428060E−17 −4.560639E−13 −2.729510E−17 1.958645E−17 4.975385E−13 −1.157245E−15 X²Y⁴ 9.034205E−16 4.633694E−13 −4.803414E−16 4.337124E−16 9.650331E−13 −6.079561E−16 Y⁶ 9.726812E−16 −1.567936E−12 −9.119915E−19 3.224937E−16 −4.013641E−13 −1.910957E−16 X⁶Y 7.541120E−20 −5.491590E−16 −3.248735E−18 −4.999870E−18 1.809992E−15 1.533677E−19 X⁴Y³ −7.407407E−19 1.626025E−15 −4.175176E−19 −1.121906E−18 4.277794E−15 7.709209E−19 X²Y⁵ −3.053897E−18 −1.459850E−15 −5.190383E−19 9.702383E−19 5.157566E−15 9.414679E−19 Y⁷ −1.167661E−17 1.377526E−14 −3.283791E−21 9.398678E−20 −3.053184E−15 3.954522E−19 X⁸ −1.128385E−22 −2.091289E−19 −1.560172E−21 −2.941200E−21 2.054965E−18 −3.788563E−21 X⁶Y² −2.424101E−21 −5.485841E−18 −1.205060E−20 −3.188366E−20 8.911569E−18 −9.560288E−21 X⁴Y⁴ 4.347588E−22 −3.722786E−17 −1.249304E−21 −8.368608E−21 1.007777E−17 −8.789392E−21 X²Y⁶ 2.577199E−21 −2.687589E−17 −2.354061E−22 8.597809E−22 1.143993E−17 −3.545101E−21 Y⁸ 5.215288E−20 −7.369037E−17 −4.229309E−23 −6.689468E−22 −7.499429E−18 −1.703637E−21 X⁸Y 7.792174E−25 0.000000E+00 −7.813621E−24 −2.516130E−23 0.000000E+00 8.396981E−25 X⁶Y³ 8.992421E−24 0.000000E+00 −1.921637E−23 −8.262460E−23 0.000000E+00 4.664369E−24 X⁴Y⁵ −4.714974E−25 0.000000E+00 −1.610571E−24 −1.778199E−23 0.000000E+00 9.398752E−24 X²Y⁷ 6.059892E−24 0.000000E+00 3.848059E−26 1.222213E−24 0.000000E+00 1.042278E−23 Y⁹ −8.700880E−23 0.000000E+00 6.368781E−27 −2.288415E−25 0.000000E+00 7.789109E−24 X¹⁰ 0.000000E+00 0.000000E+00 −5.411923E−27 −1.603639E−26 0.000000E+00 −3.929816E−26 X⁸Y² 0.000000E+00 0.000000E+00 −8.609679E−27 −4.538477E−26 0.000000E+00 −1.453997E−25 X⁶Y⁴ 0.000000E+00 0.000000E+00 −1.127835E−26 −7.710579E−26 0.000000E+00 −1.839705E−25 X⁴Y⁶ 0.000000E+00 0.000000E+00 −8.495275E−28 −1.413945E−26 0.000000E+00 −8.230974E−26 X²Y⁸ 0.000000E+00 0.000000E+00 4.740792E−29 1.022008E−27 0.000000E+00 −8.755646E−27 Y¹⁰ 0.000000E+00 0.000000E+00 1.728076E−29 1.964912E−28 0.000000E+00 −7.204080E−27 Nradius 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 Y-decenter −144.660 −98.223 42.173 −14.449 2.986 −10.929 X-rotation −8.868 −16.235 1.500 −3.658 −7.600 −1.635

FIG. 17 shows another embodiment of the disclosure having six mirrors being all designed as freeform surfaces. Depicted is the object plane 3000, the image plane 3002, a first mirror M1, a second mirror M2, a third mirror M3, a fourth mirror M4, a fifth mirror M5 and a sixth mirror M6. This projection objective has an image side numerical aperture of 0.40. The field shape is rectangular with a width of 26 mm and a height of 2 mm. The operating wavelength is 13.5 nm. The sequence of optical power of mirrors is PNPNNP. This optical system has one intermediate image between mirrors M4 and M5. The entrance pupil of this projection objective is located 1000 mm from object plane 3000, with the object plane 3000 positioned between the entrance pupil and the mirrors. A pupil plane is positioned between mirrors M2 and M3. The tracklength is 1736 mm. The object image shift is 65 mm. The optical path length is 4827 mm.

The performance of this projection objective includes an image-side W_(rms) of 0.037λ. Distortion is smaller than 12 nm. Image-side field curvature is 25 nm.

The chief ray angle of the central field point at the object is 7°. The maximum variation of chief ray angles at object plane 3000 is 0.82.

The dimension of the footprint of each mirror, given as M_(x)×M_(y) is as follows: 323 mm×215 mm for mirror M1; 131 mm×102 mm for mirror M2; 267 mm×183 mm for mirror M3; 70 mm×52 mm for mirror M4; 124 mm×109 mm for mirror M5; 447 mm×433 mm for mirror M6.

The chief ray angle of incidence for the central field point for the mirrors M1 to M6 is 4.06°; 11.34°; 12.20°; 31.60°; 12.27° and 7.64°. The maximum angles of incidence in meridional section for the mirrors M1 to M6 is 4.96°; 12.38°, 16.54°, 41.24°; 29.42° and 9.25°. The bandwidth of angle of incidence in meridional section for mirrors M1 to M6 is 1.08°; 2.71°; 9.83°; 22.72°; 29.13° and 4.28°. Mirrors M2 and M4 have freeboards that are more than 5 mm and less than 25 mm. Mirror M3 has positive chief ray angle magnification while mirrors M1, M2, M4 and M5 have negative chief ray angle magnification.

The image-side free working distance of this projection objective is 45 mm. The object-side free working distance is 400 mm.

In this projection objective, d_(op-1)/d_(op-2) is 2.67. Further, reticle and mirror M1 as well as mirrors M2 and M3 are separated by more than 50% of the projection objective tracklength.

Data for the projection objective of FIG. 17 is presented in Tables 8A, 8B below. Table 8A presents optical data, while Table 8B presents aspherical constants for each of the mirror surfaces.

TABLE 8A Surface Radius Thickness Mode Object INFINITY 1067.761 Mirror 1 −1219.687 −668.241 REFL Mirror 2 −747.811 1291.054 REFL Mirror 3 −969.893 −374.588 REFL Mirror 4 −549.105 374.588 REFL Mirror 5 470.063 −502.811 REFL Mirror 6 618.025 547.811 REFL Image INFINITY 0.000

TABLE 8B Coefficient M1 M2 M3 M4 M5 M6 K 5.078166E−01 2.515234E+00 4.458912E−01 −5.135256E+00 3.709497E+00 1.305537E−01 Y 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X² −4.229616E−06 4.423002E−05 −1.137338E−04 6.243736E−04 −4.439433E−04 1.714681E−05 Y² −2.042693E−05 −3.200090E−04 −1.490188E−04 4.230830E−05 −3.941063E−04 1.369711E−05 X²Y −2.456512E−08 −1.681122E−06 1.278895E−08 1.439095E−06 1.109021E−07 −7.066857E−09 Y³ −1.017618E−08 −1.085440E−06 −9.040764E−08 −8.248306E−07 6.038369E−07 −8.198184E−09 X⁴ 2.532498E−11 −4.655202E−10 −6.082020E−11 −7.879275E−09 −9.475896E−10 −9.236663E−12 X²Y² 2.917327E−11 −4.875362E−09 −7.951092E−11 −6.364830E−09 −2.626820E−09 −1.778520E−11 Y⁴ 1.116055E−11 9.584332E−10 −1.259982E−10 2.921676E−09 −8.367567E−10 −1.348267E−11 X⁴Y −7.018800E−15 −9.924549E−12 −5.700215E−14 −7.337153E−11 −3.015573E−13 −5.057127E−15 X²Y³ −2.588267E−14 −2.065300E−11 −1.623609E−13 −4.830483E−11 −3.421535E−12 −8.177430E−15 Y⁵ −5.631482E−14 1.175099E−13 −3.257076E−14 2.900148E−11 −5.156003E−12 −7.754740E−16 X⁶ 2.507037E−17 7.181890E−15 −6.970398E−17 1.896541E−13 −2.402650E−14 −1.687447E−17 X⁴Y² 1.805398E−16 2.845435E−14 −1.726885E−16 −3.660328E−13 −3.460882E−14 −5.258270E−17 X²Y⁴ 3.234883E−16 4.275982E−14 −3.443645E−16 −1.119940E−13 −2.515640E−14 −4.418332E−17 Y⁶ 5.139221E−17 1.240058E−14 −4.807113E−19 2.665448E−14 −3.989968E−14 −9.729792E−18 X⁶Y −1.655261E−20 2.112846E−16 −6.490967E−20 2.217817E−15 3.565159E−17 −2.533468E−21 X⁴Y³ 6.406762E−19 7.287537E−16 −1.578781E−19 −1.022968E−15 −2.246920E−17 −9.556211E−21 X²Y⁵ 1.095531E−18 4.084428E−16 −1.899934E−19 8.581644E−18 −4.609677E−16 −8.095822E−21 Y⁷ 3.534107E−19 −1.119501E−16 −6.323108E−20 −1.566387E−16 −4.089822E−16 7.022063E−21 X⁸ −2.127854E−23 5.631762E−20 −1.645304E−22 −2.809082E−18 −2.426092E−19 −2.519698E−23 X⁶Y² −2.911239E−22 1.595162E−18 1.240419E−22 8.883017E−18 −3.131391E−18 −1.169336E−22 X⁴Y⁴ 2.052045E−21 3.313410E−18 −2.644748E−22 −1.246599E−18 −8.074234E−18 −1.413514E−22 X²Y⁶ 2.303292E−21 8.331439E−19 −5.379641E−23 2.833584E−19 −6.891166E−18 −6.982184E−23 Y⁸ 7.915735E−22 −4.495038E−19 −9.241853E−23 −3.000322E−19 −2.367176E−18 −1.361196E−23 X⁸Y −3.633622E−25 −1.145501E−22 −8.423039E−26 −1.268652E−20 2.592347E−21 4.570116E−27 X⁶Y³ −1.500591E−24 1.545859E−21 6.330084E−25 1.171733E−20 1.459272E−21 1.168279E−26 X⁴Y⁵ 2.954923E−24 3.997308E−21 1.050127E−26 −4.257185E−23 −1.756358E−22 1.479131E−26 X²Y⁷ 1.472672E−24 3.951572E−22 8.889089E−29 −7.100170E−25 5.863402E−23 6.095900E−27 Y⁹ 4.265712E−25 −3.958881E−23 −1.136961E−30 −9.034885E−27 7.298215E−25 4.531322E−28 X¹⁰ 1.301003E−29 1.955419E−24 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁸Y² −6.199954E−28 −8.094414E−25 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁶Y⁴ −1.564267E−27 −8.554437E−24 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X⁴Y⁶ 2.214569E−27 1.149257E−24 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X²Y⁸ −6.083137E−29 6.386629E−26 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 Y¹⁰ 1.486303E−30 1.060932E−26 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 Nradius 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 Y-decenter 248.450 92.818 −2.826 26.446 −4.799 29.811 X-rotation 8.882 −0.938 1.151 −1.082 −3.174 −3.333

The projection objective of FIG. 17 differs from the embodiments of FIGS. 3, 10, 11, 12, 13 and 14 mainly in the shape of mirror M4. In contrast to these earlier described embodiments, mirror M4 of the embodiment of FIG. 17 is convex.

FIG. 18 shows another embodiment of the disclosure having six mirrors being all designed as freeform surfaces. Depicted is the object plane 3000, the image plane 3002, a first mirror M1, a second mirror M2, a third mirror M3, a fourth mirror M4, a fifth mirror M5 and a sixth mirror M6. This projection objective has an image side numerical aperture of 0.35. The field shape is rectangular with a width of 26 mm and a height of 2 mm. The operating wavelength is 13.5 nm. The sequence of optical power of mirrors is PPNPNP. This optical system has one intermediate image between mirrors M4 and M5. The entrance pupil of this projection objective is located on the image plane side of the object plane 3000 in a distance of 1749 mm. An aperture stop is positioned on mirror M2. The tracklength is 1700 mm. The object image shift is 41 mm. The optical path length is 4156 mm.

The performance of this projection objective includes an image-side W_(rms) of 0.020λ. Distortion is smaller than 1.1 nm. Image-side field curvature is 17 nm.

The chief ray angle of the central field point at the object is 6°. The maximum variation of chief ray angles at object plane 3000 is 0.58.

The dimension of the footprint of each mirror, given as M_(x)×M_(y) is as follows: 169 mm×148 mm for mirror M1; 159 mm×136 mm for mirror M2; 120 mm×61 mm for mirror M3; 265 mm×118 mm for mirror M4; 101 mm×77 mm for mirror M5; 345 mm×329 mm for mirror M6.

The chief ray angle of incidence for the central field point for the mirrors M1 to M6 is 8.11°; 9.49°; 21.03°; 8.01°; 13.67°; 5.03°. The maximum angle of incidence in meridional section for the mirrors M1 to M6 is 10.31′; 12.06°; 21.56°; 8.45°; 24.59°; 6.36°. The bandwidth of angle of incidence in meridional section for mirrors M1 to M6 is 4.56°; 5.34°; 1.85°; 1.23°; 22.98°; 3.16°. Mirror M4 has positive chief ray angle magnification while mirrors M1, M2, M3 and M5 have negative chief ray angle magnification.

The image-side free working distance of this projection objective is 45 mm. The object-side free working distance is 441 mm.

In this projection objective, d_(op-1)/d_(op-2) is 1.89. Further, mirrors M4 and M5 are separated by more than 50% of the projection objective tracklength.

Data for the projection objective of FIG. 18 is presented in Tables 9A, 9B below. Table 9A presents optical data, while table 9B presents aspherical constants for each of the mirror surfaces.

TABLE 9A Surface Radius Thickness Mode Object INFINITY 831.483 Mirror 1 −2519.290 −390.700 REFL Mirror 2 1736.318 0.000 REFL STOP INFINITY 510.700 Mirror 3 353.216 −404.591 REFL Mirror 4 691.089 1108.132 REFL Mirror 5 454.789 −432.650 REFL Mirror 6 522.649 477.625 REFL

TABLE 9B Coefficient M1 M2 M3 M4 M5 M6 K −5.620176E+01 −8.079329E+00 −8.913161E−01 −1.320517E+00 4.540035E+00 8.058603E−02 Y 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 X² −8.081674E−05 −2.443257E−05 −2.909041E−04 −5.514277E−05 −2.176416E−04 −1.481415E−05 Y² −1.409006E−04 −8.853894E−05 −5.146801E−04 −2.593301E−05 1.796509E−04 7.215641E−06 X²Y 1.932586E−07 4.504714E−08 9.969292E−07 −1.801177E−07 1.153365E−06 5.683301E−09 Y³ −1.223280E−07 −1.884294E−08 −4.877028E−07 1.179942E−07 −2.117705E−07 −5.600182E−09 X⁴ −7.040228E−11 7.425419E−11 2.136430E−09 4.622733E−10 −1.333652E−09 −5.926598E−11 X²Y² −1.318594E−10 1.067519E−10 9.622356E−09 −4.928633E−10 1.322772E−08 −2.894278E−11 Y⁴ 6.586919E−11 1.598749E−10 9.675806E−10 8.019884E−10 3.924061E−09 1.500259E−11 X⁴Y −1.333049E−12 9.551370E−14 4.142100E−11 7.245165E−13 −2.333334E−11 8.269178E−15 X²Y³ −7.486772E−12 −5.744418E−13 2.571945E−11 −5.121409E−12 −4.081436E−11 −1.142259E−14 Y⁵ −7.859762E−14 −1.146786E−12 1.015135E−12 7.149294E−13 −3.294173E−11 −6.514010E−14 X⁶ −1.349693E−17 −2.093126E−15 5.786287E−14 7.466543E−16 3.666869E−14 −1.312132E−16 X⁴Y² −4.117907E−15 3.600153E−15 1.917870E−13 4.761724E−15 1.666994E−13 −1.600140E−16 X²Y⁴ 2.686652E−14 2.433374E−14 1.452311E−14 −1.001928E−14 1.713311E−13 4.528614E−17 Y⁶ −6.985464E−16 −1.574024E−15 −4.040479E−15 1.285725E−15 3.233877E−13 1.795344E−16 X⁶Y −6.324670E−18 1.672711E−17 6.549813E−16 7.589572E−18 1.109670E−15 7.389564E−20 X⁴Y³ 1.633680E−16 −5.475446E−17 2.838607E−16 1.219368E−17 1.040774E−15 −3.901601E−20 X²Y⁵ 2.578083E−17 −2.114042E−17 −8.191058E−17 −1.112382E−17 −4.281539E−15 −8.922758E−19 Y⁷ −5.352170E−18 −4.852332E−17 −8.778735E−18 1.658599E−18 −1.041652E−15 −5.361021E−19 X⁸ 3.930907E−20 −3.041873E−20 1.620935E−18 3.142617E−21 −2.044671E−18 −3.471237E−22 X⁶Y² 2.642712E−19 1.926793E−19 2.461846E−18 4.103145E−20 9.496169E−18 −5.396836E−22 X⁴Y⁴ −1.209256E−18 7.815308E−19 2.461216E−20 2.400689E−20 2.006336E−17 4.153767E−23 X²Y⁶ −5.242330E−19 −2.345008E−19 −1.129636E−20 −4.573196E−22 −8.505126E−18 2.958769E−21 Y⁸ 5.723961E−20 −4.523191E−19 2.359743E−20 2.441529E−21 2.039563E−17 1.076978E−21 X⁸Y −5.843186E−22 4.059084E−22 1.256052E−20 1.926704E−23 −6.283441E−20 8.511910E−25 X⁶Y³ −1.725684E−21 −3.122858E−21 2.334258E−21 9.329420E−23 −1.729457E−19 2.027558E−25 X⁴Y⁵ 4.331458E−21 −1.961697E−21 8.015847E−22 2.907419E−23 2.503951E−19 −5.006594E−24 X²Y⁷ 1.628473E−21 −1.158132E−20 2.742066E−22 8.412546E−24 −3.164177E−19 −7.133872E−24 Y⁹ −2.174037E−22 −5.641899E−21 −6.405172E−23 1.117517E−24 1.693513E−19 −7.896547E−25 X¹⁰ 3.942480E−26 −1.611794E−24 −3.181193E−25 1.249724E−27 −2.648224E−23 −6.952534E−28 X⁸Y² 2.026760E−24 2.715637E−24 2.416966E−23 3.491430E−26 −5.242301E−22 −5.078551E−27 X⁶Y⁴ 3.177651E−24 1.517348E−23 −1.929381E−24 8.815740E−26 −7.406490E−22 −1.604907E−26 X⁴Y⁶ −6.089337E−24 −2.527074E−23 2.506522E−24 2.875808E−26 3.978023E−21 4.391294E−28 X²Y⁸ −1.609759E−24 −7.803424E−23 1.589355E−25 1.072608E−26 −2.716665E−21 4.653881E−27 Y¹⁰ 2.665008E−25 −1.428174E−23 −2.253314E−25 5.234796E−28 1.510394E−21 −1.026184E−27 Nradius 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 1.00E+00 Y-decenter −107.723 −48.244 142.711 9.140 15.331 1.453 X-rotation −3.086 0.713 −20.000 −1.900 0.245 2.474

The projection objective of FIG. 18 has chief rays converging to each other while starting from the object plane 3000.

Other embodiments are in the claims. 

1.-27. (canceled)
 28. A system, comprising: a plurality of reflective elements configured to image radiation from an object field in an object plane of the system to an image field in an image plane of the system, wherein: the system has an object image shift of about 75 mm or less; the image field is a rectangular field defined by two orthogonal directions; each orthogonal direction has a minimum dimension of about 1 mm or more; the system has an image-side numerical aperture of about 0.2 or more; and the system is a catoptric microlithography projection optical system.
 29. The system of claim 28, wherein the image-side numerical aperture of the system is more than 0.3.
 30. The system of claim 28, wherein: a path of the radiation through the system is characterized by chief rays; for a meridional section of the optical system, a chief ray of a central field point has a maximum angle of incidence on a reflective surface of each of the plurality of reflective elements of θ degrees; the image side numerical aperture of the optical system is more than 0.3; and a ratio θ/NA is less than
 68. 31. The system of claim 28, wherein at least one of the plurality of reflective elements has a rotationally asymmetric surface positioned in a path of the radiation, and the rotationally asymmetric surface deviates from a best-fit rotationally symmetric surface by at least at one or more locations, where λ is the wavelength of the radiation.
 32. The system of claim 31, wherein the best-fit rotationally asymmetric surface deviates by about 0.1λ or less from a surface corresponding to the equation: $z = {\frac{{cr}^{2}}{1 + \sqrt{1 - {\left( {1 + k} \right)c^{2}r^{2}}}} + {\sum\limits_{j = 2}^{\alpha}\; {C_{j}x^{m}y^{n}}}}$ where ${j = {\frac{\left( {m + n} \right)^{2} + m + {3n}}{2} + 1}},$ z is the sag of the surface parallel to a Z-axis of a Cartesian co-ordinate system, x and y are co-ordinates along an X-axis and a Y-axis, respectively, of the Cartesian co-ordinate system, r²=x²+y², m and n are natural numbers, c is the vertex curvature and k is the conical constant, C_(j) is the coefficient of the monomial x^(m)y^(n), and α is an integer.
 33. The system of claim 31, wherein the rotationally asymmetric surface deviates from the best-fit rotationally symmetric surface by about 10λ or more at the one or more locations.
 34. The system of claim 28, wherein the plurality of reflective elements define a meridional plane and the plurality of reflective elements are mirror symmetric with respect to the meridional plane.
 35. The system of claim 28, wherein the plurality of reflective elements comprises two elements that are reflective elements and that have rotationally asymmetric surfaces positioned in a path of the radiation.
 36. The system of claim 28, wherein the plurality of elements includes at most two reflective elements that have a positive chief ray angle magnification.
 37. The system of claim 28, wherein the plurality of elements includes at most one reflective element that has a positive chief ray angle magnification.
 38. The system of claim 28, wherein wavefront error at the image field is about λ/14 or less, where λ is the wavelength of the radiation.
 39. The system of claim 28, wherein chief rays are parallel to each other to within 0.05° at the object plane.
 40. The system of claim 28, wherein chief rays diverge from each other at the object plane.
 41. The system of claim 28 wherein, for a meridional section of the system, chief rays have a maximum angle of incidence on a surface of each of the elements of less than 20°.
 42. The system of claim 28, wherein the system is telecentric at the image plane.
 43. The system of claim 28, further comprising a radiation source configured to provide the radiation to an object plane, wherein a wavelength of the radiation is about 30 nm or less.
 44. A tool, comprising: an illumination system comprising one or more optical elements; and a catoptric microlithography projection optical system, comprising: a plurality of reflective elements configured to image radiation from an object field in an object plane of the catoptric microlithography projection optical system to an image field in an image plane of the catoptric microlithography projection optical system, wherein: the catoptric microlithography projection optical system has an object image shift of about 75 mm or less; the image field is a rectangular field defined by two orthogonal directions; each orthogonal direction has a minimum dimension of about 1 mm or more; the catoptric microlithography projection optical system has an image-side numerical aperture of about 0.2 or more; and the tool is a microlithography tool.
 45. A method of using a microlithography tool comprising an illumination system and a catoptric projection optical system, the method comprising: using the illumination system to illuminate an object in an object field; and using the catoptric projection optical system to project the object into an image field, wherein the catoptric projection optical system comprises the system of claim
 28. 46. A system, comprising: a plurality of reflective elements configured to image radiation from an object field in an object plane of the system to an image field in an image plane of the system, wherein: the system has an object image shift of about 75 mm or less; the image field has a size of at least 1 mm×1 mm; the system has an image-side numerical aperture of about 0.4 or more; and the system is a catoptric microlithography projection optical system.
 47. The system of claim 46, wherein the image field is a rectangular field defined by two orthogonal directions, and each orthogonal direction has a minimum dimension of about 1 mm or more.
 48. A tool, comprising: an illumination system comprising one or more optical elements; and a catoptric microlithography projection optical system, comprising: a plurality of reflective elements configured to image radiation from an object field in an object plane of the catoptric microlithography projection optical system to an image field in an image plane of the catoptric microlithography projection optical system, wherein: the catoptric microlithography projection optical system has an object image shift of about 75 mm or less; the image field has a size of at least 1 mm×1 mm; the system has an image-side numerical aperture of about 0.4 or more; and the tool is a microlithography tool.
 49. A method of using a microlithography tool comprising an illumination system and a catoptric projection optical system, the method comprising: using the illumination system to illuminate an object in an object field; and using the catoptric projection optical system to project the object into an image field, wherein the catoptric projection optical system comprises the system of claim
 46. 